Charles Jens Archer - Rochester MN, US Michael Alan Blocksome - Rochester MN, US Todd Alan Inglett - Rochester MN, US Derek Lieber - Yorktown Heights NY, US Patrick Joseph McCarthy - Rochester MN, US Michael Basil Mundy - Rochester MN, US Jeffrey John Parker - Rochester MN, US Joseph D. Ratterman - Rochester MN, US Brian Edward Smith - Rochester MN, US
International Classification:
G06F 13/24
US Classification:
710260
Abstract:
Embodiments of the present invention provide techniques for protecting critical sections of code being executed in a lightweight kernel environment suited for use on a compute node of a parallel computing system. These techniques avoid the overhead associated with a full kernel mode implementation of a network layer, while also allowing network interrupts to be processed without corrupting shared memory state. In one embodiment, a fast user-space function sets a flag in memory indicating that interrupts should not progress and also provides a mechanism to defer processing of the interrupt.
Fast Interrupt Disabling And Processing In A Parallel Computing Environment
Charles Jens Archer - Rochester MN, US Michael Alan Blocksome - Rochester MN, US Todd Alan Inglett - Rochester MN, US Derek Lieber - Yorktown Heights NY, US Patrick Joseph McCarthy - Rochester MN, US Michael Basil Mundy - Rochester MN, US Jeffrey John Parker - Rochester MN, US Joseph D. Ratterman - Rochester MN, US Brian Edward Smith - Rochester MN, US
International Classification:
G06F 13/24
US Classification:
710262
Abstract:
Embodiments of the present invention provide techniques for protecting critical sections of code being executed in a lightweight kernel environment suited for use on a compute node of a parallel computing system. These techniques avoid the overhead associated with a full kernel mode implementation of a network layer, while also allowing network interrupts to be processed without corrupting shared memory state. In one embodiment, a system call may be used to disable interrupts upon entry to a routine configured to process an event associated with the interrupt.
Lee Richard Nackman - White Plains NY Michael Karasick - Ossining NY John Joseph Barton - Mahopac NY Derek Lieber - Yorktown Heights NY David Joseph Streeter - Scarborough, CA
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
G06F 9445
US Classification:
717 5
Abstract:
An enhanced compiler for compiling C++ programs without the use of forward declarations normally included in program header files. Through multiple parsing passes, the compiler extracts definitions for the declarations directly from the bodies of the C++ files. By saving the definitions to a persistent program representation, for example a program database, on subsequent sweeps, only definitions for new or changed declarations need be updated. In this way, C++ programs can be incrementally compiled on a declaration by declaration basis.
Probe Assembly For Measuring Conductivity Of Plated Through Holes
Robert O. Wahl - Sound Beach NY Derek Lieber - North Merrick NY Jay M. Lesser - Freeport NY
Assignee:
UPA Technology, Inc. - Syosset NY
International Classification:
G01R 106 G01R 2714
US Classification:
324 65P
Abstract:
An improved probe assembly for measuring the conductivity of a plated through hole in a circuit board. The probe assembly having a longitudinal housing and including at the forward end thereof a segmented current injection electrode, each segment being spring biased forwardly and capable of independent movement longitudinally with respect to the housing between a forward position and rearward position. The segmented current injection electrode injecting current into the through hole substantially 360. degree. of the circular edge formed by the intersection of the walls defining the through hole and the surface of the circuit board. A voltage measurement electrode being a knife-blade electrode is positioned in the interstices between the segments of the current injection electrode. The voltage measurement electrode also being spring biased in a forward direction and capable of longitudinal movement between a forward position and a rearward position. The voltage measurement electrode contacting the circular edge of the through hole at multiple points to insure a good electrical contact for voltage measurement.
Backscatter Instrument Having Indexing Feature For Measuring Coating Thickness Of Elements On A Continuously Moving Web Of Substrate Material
James Saunders - Pleasantville NY William D. Hay - Peekskill NY Jacques Weinstock - Flushing NY Derek Lieber - North Merrick NY
Assignee:
Unit Process Assemblies, Inc. - Syosset NY
International Classification:
G01N 2300
US Classification:
250308
Abstract:
A backscatter measurement device for measuring the thickness of a coating on elements forming a web of substrate material moving from a feed supply to a take-up location at a predetermined speed. A measurement wheel is provided, adjacent to the rim of which is mounted a backscatter probe for irradiating and detecting the backscattered radiation from a coated substrate. The web of substrate material is threaded around the outer surface of the rim. The measurement wheel is rotated at a speed such that the tangential speed of a point on the rim equals the speed of the moving web whereby the probe and an adjacent point on the web are stationary relative to one another while the point on the web is adjacent the rim. Thus thickness measurements may be taken without stopping the movement of the coated web. This backscatter measurement device is further provided with indexing apparatus to position automatically the probe directly adjacent an element to be measured on the web.
Backscatter Instrument For Measuring Thickness Of A Continuously Moving Coated Strip Of Substrate Material
Jacques Weinstock - Flushing NY Derek Lieber - North Merrick NY William Dunning Hay - Peekskill NY
Assignee:
Unit Process Assemblies, Inc. - Syosset NY
International Classification:
G01N 2300
US Classification:
250308
Abstract:
A backscatter measurement device for measuring the thickness of a coating on a strip of substrate material moving from a feed supply to a take up location at a predetermined speed. A measurement wheel is provided on the rim of which are mounted backscatter probes for irradiating and detecting the backscattered radiation from the coated substrate. The coated strip of substrate material is threaded around the outer surface of the rim. The measurement wheel is rotated at a speed such that the tangential speed of a point on the rim equals the speed of the moving strip whereby the probe and an adjacent point on the strip are stationary relative to one another while the point on the strip is adjacent the rim. Thus thickness measurements may be taken without stopping the movement of the coated strip.
Backscatter Apparatus And Method For Measuring Thickness Of A Continuously Moving Coated Strip Of Substrate Material
Jacques Weinstock - Flushing NY Derek Lieber - North Merrick NY William D. Hay - Peekskill NY
Assignee:
Unit Process Assemblies, Inc. - Syosset NY
International Classification:
G01N 2300
US Classification:
250308
Abstract:
A backscatter measurement device for measuring the thickness of a coating on a strip of substrate material moving from a feed supply to a take up location at a predetermined speed. A measurement wheel is provided on the rim of which are mouted backscatter probes for irradiating and detecting the backscattered radiation from the coated substrate. The coated strip of substrate material is threaded around the outer surface of the rim. The measurement wheel is rotated at a speed such that the tangential speed of a point on the rim equals the speed of the moving strip whereby the probe and an adjacent point on the strip are stationary relative to one another while the point on the strip is adjacent the rim. Thus thickness measurements may be taken without stopping the movement of the coated strip.
Thickness Measurement Instrument With Memory Storage Of Multiple Calibrations
Sidney Lieber - Kings Point NY Julius Schlesinger - Deer Park NY Derek Lieber - North Merrick NY Alfred Baker - Plainview NY
Assignee:
Unit Process Assemblies, Inc. - Syosset NY
International Classification:
G01N 2300 G01D 1800
US Classification:
250308
Abstract:
An improved backscatter instrument for the nondestructive measurement of coatings on a substrate. A memory having selectable memory areas, each area having stored intelligence available which is determinative of the shape of a functional plot of coating thickness versus backscatter counts per minute unique for each particular combination of emitting isotope, substrate material, coating material and physical characteristics of the measuring instrument. A memory selector switch connects a selected area of memory to a microprocessor operating under program control whereby the microprocessor reads the intelligence stored at the selected area and converts the backscattered count of the coating being measured into indicia of coating thickness.
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