Heidi Beatty

US Patent:

20100064463, Mar 18, 2010

Filed:

Sep 15, 2008

Appl. No.:

12/210682

Inventors:

Heidi Beatty - Hillsborough NJ, US
Luz Maria Romero Tarazona - Padova, IT
Alessandro Vassallo - Madrid, ES

International Classification:

A47L 25/00

US Classification:

15227, 152091

Abstract:

The present invention relates to a wipe assembly including a plurality of wipes arranged in a stacked configuration, each one of the wipes having a first surface and an opposed second surface, each one of the wipes being capable of rotation from a first position to a second position, each of the wipes being arranged such that in the first position the second surface of the wipe is arranged in an outwardly facing configuration and in the second position the second surface of an underlying wipe is arranged in an outwardly facing configuration.

US Patent:

20100064464, Mar 18, 2010

Filed:

Sep 15, 2008

Appl. No.:

12/210729

Inventors:

Heidi Beatty - Hillsborough NJ, US
Luz Maria Romero Tarazona - Padova, IT
Alessandro Vassallo - Madrid, ES

International Classification:

A47L 25/00

US Classification:

15227, 152091

Abstract:

The present invention relates to a wipe assembly including a plurality of wipes arranged in a stacked configuration and a method of cleaning using such wipe assembly. Each one of the wipes includes a first surface and a second surface and is capable of rotation from a first position to a second position, each of the wipes being structured and arranged such that in the first position a second surface of the wipe is arranged in an outwardly facing configuration and in the second position a second surface of an underlying wipe is arranged in an outwardly facing configuration.

US Patent:

20100228204, Sep 9, 2010

Filed:

Jan 29, 2010

Appl. No.:

12/696674

Inventors:

Heidi Beatty - Old Tappan NJ, US
Dan Formosa - Piermont NY, US
Julie Francoeur - Boumemouth, GB
Sachiko Uozumi - New York NY, US

International Classification:

A61M 35/00
A42B 1/18

US Classification:

604303, 2206

Abstract:

The present invention features a facial mask including a water-insoluble, liquid-retaining layer sized and shaped to lie against and substantially coincident with a face of a human user and having at least one opening formed therethrough. The facial mask also includes an isolation layer substantially overlapping the water-insoluble, liquid-retaining layer. The isolation layer is readily separable from said water-insoluble, liquid-retaining layer. At least one opening in the water-insoluble, liquid-retaining layer is unobstructed by the isolation layer.

US Patent:

20110152795, Jun 23, 2011

Filed:

Dec 21, 2009

Appl. No.:

12/643245

Inventors:

Eduardo C.A. Aledo - Princeton NJ, US
Heidi Beatty - Old Tappan NJ, US

International Classification:

A61M 35/00
A42B 1/18

US Classification:

604290, 2206

Abstract:

The present invention features a facial mask comprising a water-insoluble, nonwoven substrate sized and shaped to lie against the face of a human user having an Average Wet Transparency Percentage of at least about 25% and/or a Percent Increase in Transparency of at least about 50%. Methods of treating the skin using facial masks are also provided.

US Patent:

20120073030, Mar 29, 2012

Filed:

Nov 29, 2011

Appl. No.:

13/305836

Inventors:

Heidi Beatty - Hillsborough NJ, US
Dan Formosa - Piermont NY, US
Julie Francoeur - Montreal, CA
Sachiko Uozumi - New York NY, US

International Classification:

A42B 1/00

US Classification:

2206

Abstract:

The present invention features a facial mask comprising a water-insoluble substrate sized and shaped to lie against and substantially coincident with a face of a human user. The water-insoluble substrate includes separation features that form laterally-extending tabs capable of overlapping the facial mask, improving its adaptability and fit. Methods of treating the skin using facial masks are also provided.

US Patent:

20090241242, Oct 1, 2009

Filed:

Mar 31, 2008

Appl. No.:

12/059273

Inventors:

Heidi Beatty - Hillsborough NJ, US
Dan Formosa - Piermont NY, US
Julie Francoeur - Montreal, CA
Sachiko Uozumi - New York NY, US

International Classification:

A42B 1/00
A45D 44/00

US Classification:

2206

Abstract:

The present invention features a facial mask comprising a water-insoluble substrate sized and shaped to lie against and substantially coincident with a face of a human user. The water-insoluble substrate includes separation features that form laterally-extending tabs capable of overlapping the facial mask, improving its adaptability and fit. Methods of treating the skin using facial masks are also provided.