Jaclyn Nha Danh

US Patent:

8282193, Oct 9, 2012

Filed:

Mar 23, 2010

Appl. No.:

12/730138

Inventors:

John Milton Brookfield - Newberg OR, US
Jaclyn Nha Danh - Camas WA, US
Kenneth Ralph Chamberlain - Oregon City OR, AL
Russell Watt - Portland OR, US

Assignee:

Xerox Corporation - Norwalk CT

International Classification:

B41J 2/15
B41J 2/145

US Classification:

347 40, 347 43, 347 68

Abstract:

A method of printing executes a software instruction using a print system controller to measure a vertical position of each row of an array of jets, having at least one offset subset of the array offset in a movement direction, adjusts timing of firing intervals for the offset subset such that the offset subset fire after a longer interval than other jets, and fires jets other than the offset subset at a predetermined firing interval. A print head has an array of transducers, an ink chamber to store ink arranged adjacent the array of transducers, and an array of jets arranged adjacent the ink chamber such that when selected ones of the array of transducers are activated, ink from the chamber exits a jet corresponding to the selected ones of the transducers, the array of jets having at least one subset of the array offset in a vertical direction relative to the other jets. A print system has a print head having an array of jets through which ink can be emitted, the array of jets having at least one subset of the array offset in a vertical direction relative to the other rows, an array of transducers arranged adjacent the array of jets to cause the jets to emit ink when activated, and a controller electrically coupled to the array of transducers to control the activation of the transducers.

US Patent:

59839074, Nov 16, 1999

Filed:

Aug 5, 1997

Appl. No.:

8/906417

Inventors:

Jaclyn N. Danh - Portland OR
Masami Nakano - Vancouver WA

Assignee:

SEH America, Inc. - Vancouver WA

International Classification:

B02B 600
C25F 100
C25F 330
C25F 500

US Classification:

134 13

Abstract:

Methods for drying semiconductor wafers following a chemical cleaning process utilize both a hot deionized water bath and medium-wavelength infrared light drying techniques. A preferred method comprises the steps of (a) maintaining a body of hot deionized water in a bath; (b) submerging multiple wafers to be dried in the body of hot deionized water in said bath; (c) slowly pushing said multiple wafers up through the surface of the body of hot deionized water in said bath; (d) providing an infrared bath containing an infrared lamp; and (e) transferring said multiple wafers to said infrared bath for drying.