Jim D Meador

US Patent:

6962769, Nov 8, 2005

Filed:

Sep 11, 2003

Appl. No.:

10/660667

Inventors:

Xie Shao - Rolla MO, US
Jim D. Meador - Ballwin MO, US
Mandar Bhave - Rolla MO, US
Vandana Krishnamurthy - Rolla MO, US
Kelly A. Nowak - Rolla MO, US
Michelle Fowler - Rolla MO, US
Shreeram V. Deshpande - Rolla MO, US

Assignee:

Brewer Science Inc. - Rolla MO

International Classification:

G03C001/492

US Classification:

4302711, 430325, 430950, 257437

Abstract:

Anti-reflective compositions and methods of using those compositions to form circuits are provided. The compositions comprise a polymer dissolved or dispersed in a solvent system. In one embodiment, the compositions comprise less than about 0. 3% by weight of a strong acid. In another embodiment, the weight ratio of strong acid to weak acid in the composition is from about 0:100 to about 25:75. Examples of preferred weak acid compounds include phenolic compounds (e. g. , Bisphenol S, Bisphenol A, α-cyano-4-hydroxycinnamic acid), carboxylic acids (e. g. , acetic acid), phosphoric acid, and cyano compounds. The polymer and other ingredients are preferably physically mixed in a solvent system. The resulting compositions are spin bowl compatible (i. e. , they do not crosslink prior to the bake stages of the microlithographic processes or during storage at room temperature).

US Patent:

7507783, Mar 24, 2009

Filed:

Feb 20, 2004

Appl. No.:

10/784045

Inventors:

Jim D. Meador - Manchester MO, US
Mariya Nagatkina - Buffalo Grove IL, US
Doug Holmes - Rolla MO, US

Assignee:

Brewer Science Inc. - Rolla MO

International Classification:

C08G 77/06

US Classification:

528 28, 528 12, 528 21, 528 23, 528 32, 528 37, 526279, 428447

Abstract:

New lithographic compositions (e. g. , for use as middle layers in trilayer processes) are provided. In one embodiment, the compositions comprise an organo-silicon polymer dispersed or dissolved in a solvent system, and preferably a crosslinking agent and a catalyst. In another embodiment, the organo-silicon polymer is replaced with a polyhedral oligomeric silsesquioxane-containing polymer and/or a polyhedral oligomeric silsesquioxane. In either embodiment, the polymer and/or compound should also include —OH groups for proper cross-linking of the composition. When used as middle layers, these compositions can be applied as very thin films with a very thin layer of photoresist being applied to the top of the middle layer. Thus, the underlying bottom anti-reflective coating is still protected even though the overall stack (i. e. , anti-reflective coating plus middle layer plus photoresist) is still thin compared to prior art stacks.

US Patent:

8383318, Feb 26, 2013

Filed:

Feb 19, 2010

Appl. No.:

12/708630

Inventors:

Jim D. Meador - Manchester MO, US
Joyce A. Lowes - Gerald MO, US

Assignee:

Brewer Science Inc. - Rolla MO

International Classification:

G03F 7/00
G03F 7/004
G03F 7/028
G03F 7/095

US Classification:

4302701, 4302711, 430913, 430927

Abstract:

Acid-sensitive, developer-soluble bottom anti-reflective coating compositions are provided, along with methods of using such compositions and microelectronic structures formed thereof. The compositions preferably comprise a crosslinkable polymer dissolved or dispersed in a solvent system. The polymer preferably comprises recurring monomeric units having adamantyl groups. The compositions also preferably comprise a crosslinker, such as a vinyl ether crosslinking agent, dispersed or dissolved in the solvent system with the polymer. In some embodiments, the composition can also comprise a photoacid generator (PAG) and/or a quencher. The bottom anti-reflective coating compositions are thermally crosslinkable, but can be decrosslinked in the presence of an acid to be rendered developer soluble.

US Patent:

8206893, Jun 26, 2012

Filed:

Oct 30, 2008

Appl. No.:

12/261971

Inventors:

Hao Xu - Rolla MO, US
Douglas J. Guerrero - Rolla MO, US
Jim D. Meador - Manchester MO, US

Assignee:

Brewer Science Inc. - Rolla MO

International Classification:

G03F 7/20
G03F 7/30
G03F 7/38
G03C 1/825
G03C 1/835

US Classification:

430311, 4302711, 430325, 430326, 430327, 430330, 4302721, 4302751, 4302781, 430950

Abstract:

Novel, developer-soluble anti-reflective coating compositions and methods of using those compositions are provided. The compositions comprise a multi-functional acid reacted with a multi-functional vinyl ether to form a branched polymer or oligomer. In use, the compositions are applied to a substrate and thermally crosslinked. Upon exposure to light and post-exposure baking, the cured polymers/oligomers will decrosslink and depolymerize, rendering the layer soluble in typical photoresist developing solutions (e. g. , alkaline developers).

US Patent:

20090226672, Sep 10, 2009

Filed:

Feb 19, 2009

Appl. No.:

12/389135

Inventors:

Jim D. Meador - Manchester MO, US
Douglas J. Guerrero - Rolla MO, US

Assignee:

Brewer Science, Inc. - Rolla MO

International Classification:

H01L 21/027
B05D 5/06
B05D 3/06
B32B 3/00

US Classification:

428161, 427 971, 427 976, 427532, 427553, 4284111, 428336

Abstract:

The present invention provides methods of fabricating microelectronics structures and the resulting structures formed thereby using a dual-layer, light-sensitive, wet-developable bottom anti-reflective coating stack to reduce reflectance from the substrate during exposure. The invention provides dye-filled and dye-attached compositions for use in the anti-reflective coatings. The anti-reflective coatings are thermally crosslinkable and photochemically decrosslinkable. The bottom anti-reflective coating stack has gradient optical properties and develops at the same time as the photoresist. The method and structure are particularly suited to high-NA lithography processes.

US Patent:

58920960, Apr 6, 1999

Filed:

Feb 8, 1996

Appl. No.:

8/598711

Inventors:

Jim D. Meador - Ballwin MO
Xie Shao - Rolla MO
Vandana Krishnamurthy - Rolla MO
Earnest C. Murphy - Rolla MO
Tony D. Flaim - St. James MO
Terry Lowell Brewer - Rolla MO

Assignee:

Brewer Science, Inc. - Rolla MO

International Classification:

C07C25509

US Classification:

558393

Abstract:

Mid-UV dyes enabling ultra thin antireflection coatings for multi-layer i-line photoetching are produced from bichalcones; bis-a-cyanoacrylates/bis-cyanoacrylamides; and 1. 4 divinylbenzenes. The dyes are nonsubliminal and differentially insoluble in standard photoresist solvents.

US Patent:

56936915, Dec 2, 1997

Filed:

Aug 21, 1995

Appl. No.:

8/517089

Inventors:

Tony D. Flaim - St.James MO
Jim D. Meador - Ballwin MO
Xie Shao - Rolla MO
Terry Lowell Brewer - Rolla MO

Assignee:

Brewer Science, Inc. - Rolla MO

International Classification:

C08L 6300
C08L 6120
C08F28310
C08K 504

US Classification:

523436

Abstract:

A thermosetting anti-reflective coating and method for making and using the same is disclosed for a broad range of exposure wavelengths, said coating containing an active curing catalyst, ether or ester linkages derived from epoxy functionality greater than 3. 0, a dye-grafted hydroxyl-functional oligomer, and an alkylated aminoplast crosslinking agent, all present in a low-to-medium alcohol-containing solvent.

US Patent:

56889879, Nov 18, 1997

Filed:

Nov 9, 1994

Appl. No.:

8/336340

Inventors:

Jim D. Meador - Ballwin MO
Xie Shao - Rolla MO
Vandana Krishnamurthy - Rolla MO
Earnest C. Murphy - Rolla MO
Tony D. Flaim - St. James MO
Terry Lowell Brewer - Rolla MO

Assignee:

Brewer Science, Inc. - Rolla MO

International Classification:

C07C25500

US Classification:

558393

Abstract:

Mid-UV dyes enabling ultra thin antireflection coatings for multi-layer i-line photoetching are produced from bichalcones; bis-a-cyanoacrylates/bis-cyanoacrylamides; and 1. 4 divinylbenzenes. The dyes are nonsubliminal and differentially insoluble in standard photoresist solvents.

Address:

1126 Grenadier Ln, Ballwin, MO 63021

VIN:

4T1BE46K37U542265

Make:

TOYOTA

Model:

CAMRY

Year:

2007