John F Harmuth

US Patent:

6351871, Mar 5, 2002

Filed:

Jun 17, 1999

Appl. No.:

09/335420

Inventors:

Krishna G. Sachdev - Hopewell Junction NY
John T. Butler - Hopewell Junction NY
Michael E. Cropp - LaGrangeville NY
Donald W. DiAngelo - Fishkill NY
John F. Harmuth - Pleasant Valley NY
James N. Humenik - LaGrangeville NY
John U. Knickerbocker - Hopewell Junction NY
Daniel S. Mackin - Pleasant Valley NY
Glenn A. Pomerantz - Kerhonkson NY
David E. Speed - Newton CT
Candace A. Sullivan - Pleasant Valley NY
Bruce E. Tripp - Rhinebeck NY
James C. Utter - Fishkill NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

A47L 2500

US Classification:

15322, 510508, 134 63, 134 93, 134 953, 1341031

Abstract:

This invention relates to the cleaning of objects that relate to semiconductor printing, such as, for example, screening masks. This invention is basically directed to removing, for example, an organic polymer-metal composite paste from screening masks used in printing conductive metal patterns onto ceramic green sheets in the fabrication of semiconductor packaging substrates. More particularly, this invention is concerned with the automated in-line cleaning of paste screening masks with an aqueous alkaline solution of a quaternary ammonium hydroxide as a more environmentally friendly alternative to non-aqueous organic solvents-based cleaning in screening operations for the production multilayer ceramic (MLC) substrates.

US Patent:

6960282, Nov 1, 2005

Filed:

Dec 21, 2001

Appl. No.:

10/026264

Inventors:

Raschid Jose Bezama - Mahopac NY, US
John F. Harmuth - Pleasant Valley NY, US
Jason Scott Miller - Poughkeepsie NY, US
Randall Jason Werner - Poughkeepsie NY, US

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

C25D017/00

US Classification:

204224R, 204224 M, 1341032, 1341033, 134172

Abstract:

An apparatus in which opposed nozzle assemblies are utilized to clean residual material, such as a metallic paste, from an article, such as a screening mask. Each of the nozzle assemblies has a first set of nozzles for spraying a cleaning agent onto the article in a first pattern to first chemically and mechanically remove residual material from the article. At least one of the nozzle assemblies has a second set of nozzles for spraying a cleaning agent onto the article in a second pattern while simultaneously applying a voltage between the second set of nozzles and the article to then chemically and electrolytically remove the remaining residual material from the article.

US Patent:

20060157085, Jul 20, 2006

Filed:

Jan 18, 2005

Appl. No.:

10/905712

Inventors:

John Harmuth - Pleasant Valley NY, US
Lester Herron - New Platz NY, US
Krystyna Semkow - Poughquag NY, US

Assignee:

INTERNATIONAL BUSINESS MACHINES CORPORATION - ARMONK

International Classification:

B08B 3/00
B05D 5/00

US Classification:

134026000, 134034000, 134094100, 134198000, 427282000, 118621000

Abstract:

A screening nest, method of screening green sheets and cleaning the mask and a mask cleaning station. The screening nest includes an electromagnet that clamps the mask to a green sheet on the nest during screening. The mask may be electromagnetically dampened during application and removal. The cleaning station electromagnetically dampens the mask during cleaning and especially during rinsing and drying.

US Patent:

51742012, Dec 29, 1992

Filed:

Jun 7, 1991

Appl. No.:

7/712263

Inventors:

Gerald S. Andris - Poughkeepsie NY
John P. Gauci - Putnam Valley NY
John F. Harmuth - Pleasant Valley NY

Assignee:

International Business Machines Corporation - Hopewell Junction NY

International Classification:

B41F 1508
H01L 2144

US Classification:

101114

Abstract:

An apparatus and method for screening a pattern of material onto a surface including detection of the instant of separation of the mask from the surface after screening. Particularly as applied to a process for making a multi-layer ceramic device with an automated apparatus, the screening process is speeded by initiating high speed movement immediately when the separation of the mask from the surface is complete. In a preferred embodiment, a shock absorber is used to limit the rate of change of motion of the mask and a sensor is placed directly on a portion of the shock absorber structure. Noise reduction is accomplished through differential sensing and thresholding to improve detection.

US Patent:

59163747, Jun 29, 1999

Filed:

Feb 9, 1998

Appl. No.:

9/021046

Inventors:

Jon A. Casey - Poughkeepsie NY
Michael E. Cropp - Lagrangeville NY
Donald W. DiAngelo - Fishkill NY
John F. Harmuth - Pleasant Valley NY
John U. Knickerbocker - Hopewell Junction NY
David C. Long - Wappingers Falls NY
Daniel S. Mackin - Pleasant Valley NY
Glenn A. Pomerantz - Kerhonkson NY
Krishna G. Sachdev - Hopewell Junction NY
David E. Speed - Newtown CT
Candace A. Sullivan - Pleasant Valley NY
Robert J. Sullivan - Pleasant Valley NY
Bruce E. Tripp - Rhinebeck NY
James C. Utter - Fishkill NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

B08B 304

US Classification:

134 37

Abstract:

A cleaning method and related apparatus for cleaning semiconductor screening masks using an aqueous alkali detergent solution applied under high pressure simultaneously from both sides of the mask, followed by a drying step that uses air knives to blow off the mask surface any residual cleaner solution.

US Patent:

54816750, Jan 2, 1996

Filed:

May 12, 1992

Appl. No.:

7/881593

Inventors:

Chris T. Kapogiannis - Poughkeepsie NY
John F. Harmuth - Pleasant Valley NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

G06F 1300
G06F 1314

US Classification:

39520013

Abstract:

A software asynchronous communication protocol between two computers allows the roles of master and slave to be switched between the computers, depending on the nature and direction of the communication. In order to avoid truncating bit strings transmitted between the computers due to a difference in the write/read cycles of the computers, the software incorporates a dwell to accommodate the slowest computer in the system.

US Patent:

62805274, Aug 28, 2001

Filed:

Jun 12, 1998

Appl. No.:

9/096841

Inventors:

Krishna G. Sachdev - Hopewell Junction NY
John T. Butler - Hopewell Junction NY
Michael E. Cropp - LaGrangeville NY
Donald W. DiAngelo - Fishkill NY
John F. Harmuth - Pleasant Valley NY
James N. Humenik - LaGrangeville NY
John U. Knickerbocker - Hopewell Junction NY
Daniel S. Mackin - Pleasant Valley NY
Glenn A. Pomerantz - Kerhonkson NY
David E. Speed - Newtown CT
Candace A. Sullivan - Pleasant Valley NY
Bruce E. Tripp - Rhinebeck NY
James C. Utter - Fishkill NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

B08B 308
C23G 114

US Classification:

134 2

Abstract:

This invention relates to the cleaning of objects that relate to semiconductor printing, such as, for example, screening masks. This invention is basically directed to removing, for example, an organic polymer-metal composite paste from screening masks used in printing conductive metal patterns onto ceramic green sheets in the fabrication of semiconductor packaging substrates. More particularly, this invention is concerned with the automated in-line cleaning of paste screening masks with an aqueous alkaline solution of a quaternary ammonium hydroxide as a more environmentally friendly alternative to non-aqueous organic solvents-based cleaning in screening operations for the production multilayer ceramic (MLC) substrates.

US Patent:

60326832, Mar 7, 2000

Filed:

Feb 26, 1999

Appl. No.:

9/258970

Inventors:

Jon A. Casey - Poughkeepsie NY
Michael E. Cropp - Lagrangeville NY
Donald W. DiAngelo - Fishkill NY
John F. Harmuth - Pleasant Valley NY
John U. Knickerbocker - Hopewell Junction NY
David C. Long - Wappingers Falls NY
Daniel S. Mackin - Pleasant Valley NY
Glenn A. Pomerantz - Kerhonkson NY
Krishna G. Sachdev - Hopewell Junction NY
David E. Speed - Newtown CT
Candace A. Sullivan - Pleasant Valley NY
Robert J. Sullivan - Pleasant Valley NY
Bruce E. Tripp - Rhinebeck NY
James C. Utter - Fishkill NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

B08B 300

US Classification:

134199

Abstract:

A cleaning method and related apparatus for cleaning semiconductor screening masks using an aqueous alkali detergent solution applied under high pressure simultaneously from both sides of the mask, followed by a drying step that uses air knives to blow off the mask surface any residual cleaner solution.