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John F Harmuth

age ~65

from Pleasant Valley, NY

Also known as:
  • John Harmuth
  • Kathyann Ann Harmuth
  • Kathy Harmuth
  • Kathy Ann Harmuth
  • Katherine Harmuth
  • Kathyann Harmuth
  • Kathy Ann Walker
147 Creek Rd, Pleasant Valley, NY 125698456358464

John Harmuth Phones & Addresses

  • 147 Creek Rd, Pleasant Vly, NY 12569 • 8456358464
  • Pleasant Valley, NY
  • Poughkeepsie, NY
  • Lebanon, PA
  • Troy, NY

Work

  • Company:
    Mpi inc.
    Sep 2011
  • Position:
    Interface technician

Education

  • School / High School:
    Dutchess Community College
    Sep 2009
  • Specialities:
    Industrial

Skills

Manufacturing equipment design and build • oven/furnace build and maintenance • HVAC work • SCADA • PLC's • servos/stepper motors • I/O systems • chemical systems.
Name / Title
Company / Classification
Phones & Addresses
John Harmuth
Principal
John's Restoration Services
Services-Misc
147 Crk Rd, Pleasant Valley, NY 12569

Resumes

John Harmuth Photo 1

John Harmuth Pleasant Valley, NY

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Work:
MPI Inc.

Sep 2011 to 2000
Interface Technician
Jabil Corp
Poughkeepsie, NY
Jun 2011 to Sep 2011
Working Supervisor, power supply test
SpectraWatt Corp
Hopewell Jct, NY
Sep 2009 to Mar 2011
Senior Engineer
Fluor Industrial Services
Hopewell Jct, NY
Jan 2008 to Aug 2009
Senior Mechanic
IBM Corp
Hopewell Jct, NY
Sep 1976 to Sep 2007
Advisory Engineer
Education:
Dutchess Community College
Sep 2009 to 2000
Industrial
Dutchess Community College
Poughkeepsie, NY
Associate in Applied Science in Electronics
Marist College
Poughkeepsie, NY
Bachelor's in Computer Science
Skills:
Manufacturing equipment design and build, oven/furnace build and maintenance, HVAC work, SCADA, PLC's, servos/stepper motors, I/O systems, chemical systems.

Us Patents

  • Aqueous Quaternary Ammonium Hydroxide As A Screening Mask Cleaner

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  • US Patent:
    6351871, Mar 5, 2002
  • Filed:
    Jun 17, 1999
  • Appl. No.:
    09/335420
  • Inventors:
    Krishna G. Sachdev - Hopewell Junction NY
    John T. Butler - Hopewell Junction NY
    Michael E. Cropp - LaGrangeville NY
    Donald W. DiAngelo - Fishkill NY
    John F. Harmuth - Pleasant Valley NY
    James N. Humenik - LaGrangeville NY
    John U. Knickerbocker - Hopewell Junction NY
    Daniel S. Mackin - Pleasant Valley NY
    Glenn A. Pomerantz - Kerhonkson NY
    David E. Speed - Newton CT
    Candace A. Sullivan - Pleasant Valley NY
    Bruce E. Tripp - Rhinebeck NY
    James C. Utter - Fishkill NY
  • Assignee:
    International Business Machines Corporation - Armonk NY
  • International Classification:
    A47L 2500
  • US Classification:
    15322, 510508, 134 63, 134 93, 134 953, 1341031
  • Abstract:
    This invention relates to the cleaning of objects that relate to semiconductor printing, such as, for example, screening masks. This invention is basically directed to removing, for example, an organic polymer-metal composite paste from screening masks used in printing conductive metal patterns onto ceramic green sheets in the fabrication of semiconductor packaging substrates. More particularly, this invention is concerned with the automated in-line cleaning of paste screening masks with an aqueous alkaline solution of a quaternary ammonium hydroxide as a more environmentally friendly alternative to non-aqueous organic solvents-based cleaning in screening operations for the production multilayer ceramic (MLC) substrates.
  • Apparatus For Cleaning Residual Material From An Article

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  • US Patent:
    6960282, Nov 1, 2005
  • Filed:
    Dec 21, 2001
  • Appl. No.:
    10/026264
  • Inventors:
    Raschid Jose Bezama - Mahopac NY,
    John F. Harmuth - Pleasant Valley NY,
    Jason Scott Miller - Poughkeepsie NY,
    Randall Jason Werner - Poughkeepsie NY,
  • Assignee:
    International Business Machines Corporation - Armonk NY
  • International Classification:
    C25D017/00
  • US Classification:
    204224R, 204224 M, 1341032, 1341033, 134172
  • Abstract:
    An apparatus in which opposed nozzle assemblies are utilized to clean residual material, such as a metallic paste, from an article, such as a screening mask. Each of the nozzle assemblies has a first set of nozzles for spraying a cleaning agent onto the article in a first pattern to first chemically and mechanically remove residual material from the article. At least one of the nozzle assemblies has a second set of nozzles for spraying a cleaning agent onto the article in a second pattern while simultaneously applying a voltage between the second set of nozzles and the article to then chemically and electrolytically remove the remaining residual material from the article.
  • Screening Nest, Method Of Screening Wiring Layers In A Multi-Layer Ceramic And Cleaning The Screening Mask And Mask Cleaning Station

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  • US Patent:
    20060157085, Jul 20, 2006
  • Filed:
    Jan 18, 2005
  • Appl. No.:
    10/905712
  • Inventors:
    John Harmuth - Pleasant Valley NY,
    Lester Herron - New Platz NY,
    Krystyna Semkow - Poughquag NY,
  • Assignee:
    INTERNATIONAL BUSINESS MACHINES CORPORATION - ARMONK
  • International Classification:
    B08B 3/00
    B05D 5/00
  • US Classification:
    134026000, 134034000, 134094100, 134198000, 427282000, 118621000
  • Abstract:
    A screening nest, method of screening green sheets and cleaning the mask and a mask cleaning station. The screening nest includes an electromagnet that clamps the mask to a green sheet on the nest during screening. The mask may be electromagnetically dampened during application and removal. The cleaning station electromagnetically dampens the mask during cleaning and especially during rinsing and drying.
  • Thick Film Mask Separation Detection System

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  • US Patent:
    51742012, Dec 29, 1992
  • Filed:
    Jun 7, 1991
  • Appl. No.:
    7/712263
  • Inventors:
    Gerald S. Andris - Poughkeepsie NY
    John P. Gauci - Putnam Valley NY
    John F. Harmuth - Pleasant Valley NY
  • Assignee:
    International Business Machines Corporation - Hopewell Junction NY
  • International Classification:
    B41F 1508
    H01L 2144
  • US Classification:
    101114
  • Abstract:
    An apparatus and method for screening a pattern of material onto a surface including detection of the instant of separation of the mask from the surface after screening. Particularly as applied to a process for making a multi-layer ceramic device with an automated apparatus, the screening process is speeded by initiating high speed movement immediately when the separation of the mask from the surface is complete. In a preferred embodiment, a shock absorber is used to limit the rate of change of motion of the mask and a sensor is placed directly on a portion of the shock absorber structure. Noise reduction is accomplished through differential sensing and thresholding to improve detection.
  • Optimized In-Line Mask Cleaning System

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  • US Patent:
    59163747, Jun 29, 1999
  • Filed:
    Feb 9, 1998
  • Appl. No.:
    9/021046
  • Inventors:
    Jon A. Casey - Poughkeepsie NY
    Michael E. Cropp - Lagrangeville NY
    Donald W. DiAngelo - Fishkill NY
    John F. Harmuth - Pleasant Valley NY
    John U. Knickerbocker - Hopewell Junction NY
    David C. Long - Wappingers Falls NY
    Daniel S. Mackin - Pleasant Valley NY
    Glenn A. Pomerantz - Kerhonkson NY
    Krishna G. Sachdev - Hopewell Junction NY
    David E. Speed - Newtown CT
    Candace A. Sullivan - Pleasant Valley NY
    Robert J. Sullivan - Pleasant Valley NY
    Bruce E. Tripp - Rhinebeck NY
    James C. Utter - Fishkill NY
  • Assignee:
    International Business Machines Corporation - Armonk NY
  • International Classification:
    B08B 304
  • US Classification:
    134 37
  • Abstract:
    A cleaning method and related apparatus for cleaning semiconductor screening masks using an aqueous alkali detergent solution applied under high pressure simultaneously from both sides of the mask, followed by a drying step that uses air knives to blow off the mask surface any residual cleaner solution.
  • Asynchronous Serial Communication System For Delaying With Software Dwell Time A Receiving Computer's Acknowledgement In Order For The Transmitting Computer To See The Acknowledgement

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  • US Patent:
    54816750, Jan 2, 1996
  • Filed:
    May 12, 1992
  • Appl. No.:
    7/881593
  • Inventors:
    Chris T. Kapogiannis - Poughkeepsie NY
    John F. Harmuth - Pleasant Valley NY
  • Assignee:
    International Business Machines Corporation - Armonk NY
  • International Classification:
    G06F 1300
    G06F 1314
  • US Classification:
    39520013
  • Abstract:
    A software asynchronous communication protocol between two computers allows the roles of master and slave to be switched between the computers, depending on the nature and direction of the communication. In order to avoid truncating bit strings transmitted between the computers due to a difference in the write/read cycles of the computers, the software incorporates a dwell to accommodate the slowest computer in the system.
  • Aqueous Quaternary Ammonium Hydroxide As A Screening Mask Cleaner

    view source
  • US Patent:
    62805274, Aug 28, 2001
  • Filed:
    Jun 12, 1998
  • Appl. No.:
    9/096841
  • Inventors:
    Krishna G. Sachdev - Hopewell Junction NY
    John T. Butler - Hopewell Junction NY
    Michael E. Cropp - LaGrangeville NY
    Donald W. DiAngelo - Fishkill NY
    John F. Harmuth - Pleasant Valley NY
    James N. Humenik - LaGrangeville NY
    John U. Knickerbocker - Hopewell Junction NY
    Daniel S. Mackin - Pleasant Valley NY
    Glenn A. Pomerantz - Kerhonkson NY
    David E. Speed - Newtown CT
    Candace A. Sullivan - Pleasant Valley NY
    Bruce E. Tripp - Rhinebeck NY
    James C. Utter - Fishkill NY
  • Assignee:
    International Business Machines Corporation - Armonk NY
  • International Classification:
    B08B 308
    C23G 114
  • US Classification:
    134 2
  • Abstract:
    This invention relates to the cleaning of objects that relate to semiconductor printing, such as, for example, screening masks. This invention is basically directed to removing, for example, an organic polymer-metal composite paste from screening masks used in printing conductive metal patterns onto ceramic green sheets in the fabrication of semiconductor packaging substrates. More particularly, this invention is concerned with the automated in-line cleaning of paste screening masks with an aqueous alkaline solution of a quaternary ammonium hydroxide as a more environmentally friendly alternative to non-aqueous organic solvents-based cleaning in screening operations for the production multilayer ceramic (MLC) substrates.
  • System For Cleaning Residual Paste From A Mask

    view source
  • US Patent:
    60326832, Mar 7, 2000
  • Filed:
    Feb 26, 1999
  • Appl. No.:
    9/258970
  • Inventors:
    Jon A. Casey - Poughkeepsie NY
    Michael E. Cropp - Lagrangeville NY
    Donald W. DiAngelo - Fishkill NY
    John F. Harmuth - Pleasant Valley NY
    John U. Knickerbocker - Hopewell Junction NY
    David C. Long - Wappingers Falls NY
    Daniel S. Mackin - Pleasant Valley NY
    Glenn A. Pomerantz - Kerhonkson NY
    Krishna G. Sachdev - Hopewell Junction NY
    David E. Speed - Newtown CT
    Candace A. Sullivan - Pleasant Valley NY
    Robert J. Sullivan - Pleasant Valley NY
    Bruce E. Tripp - Rhinebeck NY
    James C. Utter - Fishkill NY
  • Assignee:
    International Business Machines Corporation - Armonk NY
  • International Classification:
    B08B 300
  • US Classification:
    134199
  • Abstract:
    A cleaning method and related apparatus for cleaning semiconductor screening masks using an aqueous alkali detergent solution applied under high pressure simultaneously from both sides of the mask, followed by a drying step that uses air knives to blow off the mask surface any residual cleaner solution.

Mylife

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John Harmuth Pleasant Va...

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Classmates

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John Harmuth

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Schools:
Sound School New Haven CT 2002-2006
Community:
Cathe Marucci, Tara Collins
John Harmuth Photo 4

Sound School, New haven, ...

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Graduates:
Elizabeth Rosario (2001-2005),
Alex Perez (1991-1995),
John Harmuth (2002-2006),
Lenelah Maddox (1990-1994),
Ervin Burney (1995-1999)
John Harmuth Photo 5

Parsippany Hills High Sch...

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Graduates:
Doreen Partington (1971-1975),
Jeanne Ruder (1973-1975),
William Foley (1978-1982),
John Harmuth (1970-1974),
John Schmitt (1992-1996)
John Harmuth Photo 6

Marist College, Poughkeep...

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Graduates:
John Harmuth (1982-1989),
Abby Van Horne (1996-2000)

Googleplus

John Harmuth Photo 7

John Harmuth

Lived:
Pleasant Valley ,NY
Work:
MPI Corp - Interface Technician
Education:
John Jay HS

Facebook

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John Harmuth

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