John Frederick Lesoine

Deceased

from San Jose, CA

Get Report

Also known as:

John F Lesoine
John D Lesoine
John David Lesoine
John E Lesoine
Jonh D Lesoine

Phone and address:: 1584 Chambers Dr, San Jose, CA 95118

Connected to:

John Lesoine Phones & Addresses

1584 Chambers Dr, San Jose, CA 95118
60 Schoolhouse Rd, E Stroudsburg, PA 18301
East Stroudsburg, PA
Gaithersburg, MD
225 Conant Rd, Rochester, NY 14623
290 River St, Rochester, NY 14623
Bethlehem, PA

Work

Company:

National institute of standards and technology
May 2010
Position:

Research associate

Education

School / High School:

University of Rochester- Rochester, NY
Jan 2003
Specialities:

Doctor of Philosophy in Optical Physics

Skills

1) Theoretical propagation of light and ... • including attenuation and wavelength dis... • Fourier Transform theory • probability theory. 7) Broad knowledge o... • lenses • optical amplifiers • lasers • light emitting diodes • interferometers • spectrometers • detectors. 8) Design of electromagnetic ... • LabView

Languages

English • German

Interests

Kayaking • Children • Skiing • Experimental Design • Canoeing • Barbecueing • Economic Empowerment • See 1 • Hammer Throwing • See Less • Education • Hiking • Science and Technology • Dining Out • Health • Digital Photography • Ice Cream Making • Bayesian Probability Theory

Industries

Semiconductors

Resumes

System Design Engineer

view source

Location:

Milpitas, CA

Industry:

Semiconductors

Work:

Nanometrics
Staff Systems Engineer
Kla-Tencor Apr 1, 2015 - Nov 2017
Senior System Design Engineer: Lead Engineer
Kla-Tencor Sep 2014 - Apr 2015
Senior Product Development Engineer
Kla-Tencor Jul 2012 - Sep 2014
Product Development Engineer
National Institute of Standards and Technology May 2010 - May 2012
Nrc Arra Postdoc

Education:

University of Rochester 2003 - 2010
Doctorates, Doctor of Philosophy Moravian College 1999 - 2003
Bachelors, Bachelor of Science, Physics East Stroudsburg Senior High School 1999

Skills:

Optics
Physics
Photonics
Matlab
Thin Films
Spectroscopy
Labview
Characterization
Nanotechnology
Semiconductors
Simulations
Latex
Fluorescence Microscopy
Lithography
Biomedical Engineering
Optical Engineering
R&D
Sensors
Confocal Microscopy
Metrology
Research
Testing
Design of Experiments
Science
Product Development
Failure Analysis
Signal Processing
Uv Lithography
Experimentation
Image Processing
Laser
Microscopy
Engineering
Photolithography
Laser Physics
Semiconductor Industry
Systems Engineering
Algorithms
Spc
Ellipsometry
Jmp
Numerical Analysis
Programming
Fluorescence Spectroscopy
Fret
Fluorescence
Scanning Electron Microscopy
Tem
Optical Microscopy

Interests:

Kayaking
Children
Skiing
Experimental Design
Canoeing
Barbecueing
Economic Empowerment
See 1
Hammer Throwing
See Less
Education
Hiking
Science and Technology
Dining Out
Health
Digital Photography
Ice Cream Making
Bayesian Probability Theory

Languages:

English
German

John Lesoine Gaithersburg, MD

view source

Work:

National Institute of Standards and Technology

May 2010 to 2000
Research Associate

Education:

University of Rochester
Rochester, NY
Jan 2003 to Jan 2010
Doctor of Philosophy in Optical Physics Moravian College
Bethlehem, PA
Sep 1999 to May 2003
BS in Physics

Skills:

1) Theoretical propagation of light and electromagnetic radiation through free space and matter. 2) Theoretical modeling of the coupling of free space electromagnetic radiation to dipole antennas. 3) Modeling the emission patterns and reception patterns of dipole antennas and dipole antenna arrays. 4) Modeling guided electromagnetic wave propagation in optical fibers, including attenuation and wavelength dispersion. 5) Modeling and experimental expertise with the interaction of polarized light and matter. 6) Math: Differential equations, Fourier Transform theory, probability theory. 7) Broad knowledge of optical components and devices: mirrors, lenses, optical amplifiers, lasers, light emitting diodes, interferometers, spectrometers, detectors. 8) Design of electromagnetic imaging and detection systems. 9) Optical lock-in detection of intensity modulated signals or polarization modulated signals. 10) Rigorous calibration of scientific instruments. 11) Image enhancement through deconvolution. 12) Programming: MATLAB, LabView

Us Patents

Beamsplitter Based Ellipsometer Focusing System
view source
US Patent:

20210096062, Apr 1, 2021
Filed:

Oct 1, 2019
Appl. No.:

16/590373
Inventors:

- WILMINGTON MA, US
John F. Lesoine - San Jose CA, US
International Classification:

G01N 21/21
G02B 7/28
G01J 3/02
Abstract:

An ellipsometer includes a focusing system that uses an image of the measurement spot to determine a best focal position for the ellipsometer. The focus signal is produced by splitting off the ellipsometer measurement spot before the signal is analyzed by a polarizer thereby avoiding imagining the spot with a modulated intensity. The focus signal is imaged on a sensor array and based on the position of the spot on the sensor array, the focal position of the ellipsometer may be determined. A single image may be used to determine the focal position of the ellipsometer permitting a real time focus position measurement.

Bandgap Measurements Of Patterned Film Stacks Using Spectroscopic Metrology
view source
US Patent:

20190041266, Feb 7, 2019
Filed:

Aug 8, 2017
Appl. No.:

15/672120
Inventors:

- Milpitas CA, US
Aaron Rosenberg - Milpitas CA, US
Dawei Hu - Milpitas CA, US
Alexander Kuznetsov - Milpitas CA, US
Manh Dang Nguyen - Milpitas CA, US
Stilian Pandev - Santa Clara CA, US
John Lesoine - Milpitas CA, US
Qiang Zhao - Milpitas CA, US
Liequan Lee - Fremont CA, US
Houssam Chouaib - San Jose CA, US
Ming Di - Hayward CA, US
Torsten R. Kaack - Los Altos CA, US
Andrei V. Shchegrov - Campbell CA, US
Zhengquan Tan - Milpitas CA, US
International Classification:

G01J 3/18
G01J 3/28
Abstract:

A spectroscopic metrology system includes a spectroscopic metrology tool and a controller. The controller generates a model of a multilayer grating including two or more layers, the model including geometric parameters indicative of a geometry of a test layer of the multilayer grating and dispersion parameters indicative of a dispersion of the test layer. The controller further receives a spectroscopic signal of a fabricated multilayer grating corresponding to the modeled multilayer grating from the spectroscopic metrology tool. The controller further determines values of the one or more parameters of the modeled multilayer grating providing a simulated spectroscopic signal corresponding to the measured spectroscopic signal within a selected tolerance. The controller further predicts a bandgap of the test layer of the fabricated multilayer grating based on the determined values of the one or more parameters of the test layer of the fabricated structure.

Metrology System Calibration Refinement
view source
US Patent:

20180100796, Apr 12, 2018
Filed:

Dec 8, 2017
Appl. No.:

15/836160
Inventors:

- Milpitas CA, US
John Lesoine - San Jose CA, US
Malik Sadiq - Walnut Creek CA, US
Lanhua Wei - Fremont CA, US
Shankar Krishnan - Santa Clara CA, US
Leonid Poslavsky - Belmont CA, US
Mikhail M. Sushchik - Pleasanton CA, US
International Classification:

G01N 21/21
G01N 21/95
G01N 21/27
Abstract:

Methods and systems for matching measurement spectra across one or more optical metrology systems are presented. The values of one or more system parameters used to determine the spectral response of a specimen to a measurement performed by a target metrology system are optimized. The system parameter values are optimized such that differences between measurement spectra generated by a reference system and the target system are minimized for measurements of the same metrology targets. Methods and systems for matching spectral errors across one or more optical metrology systems are also presented. A trusted metrology system measures the value of at least one specimen parameter to minimize model errors introduced by differing measurement conditions present at the time of measurement by the reference and target metrology systems. Methods and systems for parameter optimization based on low-order response surfaces are presented to reduce the compute time required to refine system calibration parameters.

Metrology System Calibration Refinement
view source
US Patent:

20140340682, Nov 20, 2014
Filed:

May 15, 2014
Appl. No.:

14/277898
Inventors:

- Milpitas CA, US
John Lesoine - San Jose CA, US
Malik Sadiq - Walnut Creek CA, US
Lanhua Wei - Fremont CA, US
Shankar Krishnan - Santa Clara CA, US
Leonid Poslavsky - Belmont CA, US
Mikhail M. Sushchik - Castro Valley CA, US
International Classification:

G01N 21/21
G01N 21/95
US Classification:

356369
Abstract:

Methods and systems for matching measurement spectra across one or more optical metrology systems are presented. The values of one or more system parameters used to determine the spectral response of a specimen to a measurement performed by a target metrology system are optimized. The system parameter values are optimized such that differences between measurement spectra generated by a reference system and the target system are minimized for measurements of the same metrology targets. Methods and systems for matching spectral errors across one or more optical metrology systems are also presented. A trusted metrology system measures the value of at least one specimen parameter to minimize model errors introduced by differing measurement conditions present at the time of measurement by the reference and target metrology systems. Methods and systems for parameter optimization based on low-order response surfaces are presented to reduce the compute time required to refine system calibration parameters.