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John A Lilleland

age ~62

from Morgan Hill, CA

Also known as:
  • John Arnold Lilleland
  • John A Lilland
Phone and address:
16285 Church St, Morgan Hill, CA 95037
8313204607

John Lilleland Phones & Addresses

  • 16285 Church St, Morgan Hill, CA 95037 • 8313204607 • 4087791657
  • 80 Barrett Ave, Morgan Hill, CA 95037
  • 17680 Bentley Dr, Morgan Hill, CA 95037
  • San Jose, CA
  • San Martin, CA
  • Santa Clara, CA
Name / Title
Company / Classification
Phones & Addresses
John Lilleland
President
SILECO CORPORATION
PO Box 71001, Sunnyvale, CA 94086
John A. Lilleland
President
XCELOMER, INC
Nonclassifiable Establishments
6781 Via Del Oro, San Jose, CA 95119
John Lilleland
President, Manager
SEMICONDUCTOR TOOLING SERVICES, INC
Repair Services
6781 Via Del Oro, San Jose, CA 95119
219 Vineyard Ct, Morgan Hill, CA 95037
4087766646, 4087766648

Us Patents

  • Method Of Manufacturing Assembly For Plasma Reaction Chamber And Use Thereof

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  • US Patent:
    6376385, Apr 23, 2002
  • Filed:
    Feb 23, 2001
  • Appl. No.:
    09/790715
  • Inventors:
    John Lilleland - San Jose CA
    Jerome S. Hubacek - Fremont CA
    William S. Kennedy - Redwood Shores CA
  • Assignee:
    Lam Research Corporation - Fremont CA
  • International Classification:
    H01L 21302
  • US Classification:
    438710, 156345, 118723 E
  • Abstract:
    An electrode assembly for a plasma reaction chamber wherein processing of a semiconductor substrate such as a single wafer can be carried out, a method of manufacture of the electrode assembly and a method of processing a semiconductor substrate with the assembly. The electrode assembly includes a support member such as a graphite ring, an electrode such as a silicon showerhead electrode in the form of a circular disk of uniform thickness and an elastomeric joint between the support member and the electrode. The elastomeric joint allows movement between the support member and the electrode to compensate for thermal expansion as a result of temperature cycling of the electrode assembly. The elastomeric joint can include an electrically and/or thermally conductive filler and the elastomer can be a catalyst-cured polymer which is stable at high temperatures.
  • Electrode For Plasma Processes And Method For Manufacture And Use Thereof

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  • US Patent:
    61487651, Nov 21, 2000
  • Filed:
    Sep 9, 1999
  • Appl. No.:
    9/392265
  • Inventors:
    John Lilleland - San Jose CA
    Jerome S. Hubacek - Fremont CA
    William S. Kennedy - Redwood Shores CA
  • Assignee:
    Lam Research Corporation - Fremont CA
  • International Classification:
    C23C 1600
  • US Classification:
    118723E
  • Abstract:
    An electrode assembly for a plasma reaction chamber wherein processing of a semiconductor substrate such as a single wafer can be carried out, a method of manufacture of the electrode assembly and a method of processing a semiconductor substrate with the assembly. The electrode assembly includes a support member such as a graphite ring, an electrode such as a silicon showerhead electrode in the form of a circuit disk of uniform thickness and an elastomeric joint between the support member and the electrode. The elastomeric joint allows movement between the support member and the electrode to compensate for thermal expansion as a result of temperature cycling of the electrode assembly. The elastomeric joint can include an electrically and/or thermally conductive filler and the elastomer can be a catalyst-cured polymer which is stable at high temperatures.
  • Electrode For Plasma Processes And Method For A Manufacture And Use Thereof

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  • US Patent:
    61943223, Feb 27, 2001
  • Filed:
    Jul 31, 2000
  • Appl. No.:
    9/629457
  • Inventors:
    John Lilleland - San Jose CA
    Jerome S. Hubacek - Fremont CA
    William S. Kennedy - Redwood Shores CA
  • Assignee:
    Lam Research Corporation - Fremont CA
  • International Classification:
    H01L 21302
  • US Classification:
    438710
  • Abstract:
    An electrode assembly for a plasma reaction chamber wherein processing of a semiconductor substrate such as a single wafer can be carried out, a method of manufacture of the electrode assembly and a method of processing a semiconductor substrate with the assembly. The electrode assembly includes a support member such as a graphite ring, an electrode such as a silicon showerhead electrode in the form of a circular disk of uniform thickness and an elastomeric joint between the support member and the electrode. The elastomeric joint allows movement between the support member and the electrode to compensate for thermal expansion as a result of temperature cycling of the electrode assembly. The elastomeric joint can include an electrically and/or thermally conductive filler and the elastomer can be a catalyst-cured polymer which is stable at high temperatures.
  • Electrode For Plasma Processes And Method For Manufacture And Use Thereof

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  • US Patent:
    60735775, Jun 13, 2000
  • Filed:
    Jun 30, 1998
  • Appl. No.:
    9/107471
  • Inventors:
    John Lilleland - San Jose CA
    Jerome S. Hubacek - Fremont CA
    William S. Kennedy - Redwood Shores CA
  • Assignee:
    Lam Research Corporation - Fremont CA
  • International Classification:
    H01L 2100
  • US Classification:
    118723E
  • Abstract:
    An electrode assembly for a plasma reaction chamber wherein processing of a semiconductor substrate such as a single wafer can be carried out, a method of manufacture of the electrode assembly and a method of processing a semiconductor substrate with the assembly. The electrode assembly includes a support member such as a graphite ring, an electrode such as a silicon showerhead electrode in the form of a circular disk of uniform thickness and an elastomeric joint between the support member and the electrode. The elastomeric joint allows movement between the support member and the electrode to compensate for thermal expansion as a result of temperature cycling of the electrode assembly. The elastomeric joint can include an electrically and/or thermally conductive filler and the elastomer can be a catalyst-cured polymer which is stable at high temperatures.
  • Temperature Detector Probe With Thermal Isolation

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  • US Patent:
    20220214225, Jul 7, 2022
  • Filed:
    Mar 22, 2022
  • Appl. No.:
    17/700582
  • Inventors:
    - St. Louis MO, US
    John LILLELAND - Morgan Hill CA, US
  • Assignee:
    Watlow Electric Manufacturing Company - St. Louis MO
  • International Classification:
    G01K 7/02
    G01K 1/16
    G01K 1/143
    G01K 1/08
    G01K 1/14
  • Abstract:
    The present disclosure is directed toward a temperature detector probe that includes a housing, a pair of electrical connectors, a support cap, and a sensor. The housing defines a bore longitudinally extending through the housing, and the pair of electrical connectors extend through the bore. The support cap is disposed at a first end portion of the housing. The sensor is provided on the support cap and is electrically coupled to the pair of electrical connectors. The support cap is positioned between the pair of electrical connectors and the support cap.
  • Continuous Helical Baffle Heat Exchanger

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  • US Patent:
    20230059671, Feb 23, 2023
  • Filed:
    Sep 28, 2022
  • Appl. No.:
    17/954448
  • Inventors:
    - ST. LOUIS MO, US
    Ethan DINAUER - St. Louis MO, US
    Sanhong ZHANG - Ballwin MO, US
    Scott H. BOEHMER - Hannibal MO, US
    Scott YARBROUGH - St. Louis MO, US
    Troy Ruben BOLTON - St. Louis MO, US
    John LILLELAND - Morgan Hill CA, US
    Jacob WILSON - St. Charles MO, US
    Mike BANGE - Elsberry MO, US
    Mark D. EVERLY - St. Charles MO, US
  • Assignee:
    WATLOW ELECTRIC MANUFACTURING COMPANY - ST. LOUIS MO
  • International Classification:
    F28F 9/22
    F28F 9/013
    F28D 7/16
    F28D 7/06
  • Abstract:
    A heater includes a flow guide and a plurality of electrical resistance heating elements. The flow guide defines a continuous geometric helicoid disposed about a longitudinal axis of the heater assembly. The flow guide defines a predetermined pattern of perforations that extend in a longitudinal direction through a first longitudinal length of the geometric helicoid, the longitudinal direction being parallel to the longitudinal axis. The plurality of electrical resistance heating elements extend through the perforations. At least one electrical resistance heating element of the plurality of electrical resistance heating elements has a first region with a first watt density and a second region with a second watt density. The second region is located farther in the longitudinal direction than the first region. The second watt density is less than the first watt density.
  • System And Method For Predicting And Controlling Gas Line Performance

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  • US Patent:
    20200400530, Dec 24, 2020
  • Filed:
    Jun 22, 2020
  • Appl. No.:
    16/907976
  • Inventors:
    - St. Louis MO, US
    Fatemeh NOSRATI - San Jose CA, US
    Jacob LINDLEY - St. Louis MO, US
    John LILLELAND - Morgan Hill CA, US
    Sanhong ZHANG - Ballwin MO, US
  • Assignee:
    Watlow Electric Manufacturing Company - St. Louis MO
  • International Classification:
    G01M 7/02
    G05B 19/042
    G05B 19/4097
    H01L 21/67
  • Abstract:
    A method of monitoring a condition of a dynamic system includes installing a vibration signal acquisition device at a predetermined location of the dynamic system, acquiring vibration signals by the vibration signal acquisition device, analyzing the vibration signals in a frequency domain, and predicting a change in the condition of the dynamic system based on the vibration signals in the frequency domain. A system is also provided, and a condition of the dynamic system includes clogging.
  • Temperature Detector Probe With Thermal Isolation

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  • US Patent:
    20190293495, Sep 26, 2019
  • Filed:
    Mar 21, 2019
  • Appl. No.:
    16/360669
  • Inventors:
    - St. Louis MO, US
    John LILLELAND - Morgan Hill CA, US
  • Assignee:
    Watlow Electric Manufacturing Company - St. Louis MO
  • International Classification:
    G01K 7/02
    G01K 1/14
    G01K 1/16
  • Abstract:
    The present disclosure is directed toward a temperature detector probe that includes a housing, a pair of electrical connectors, a support cap, and a sensor. The housing defines a bore longitudinally extending through the housing, and the pair of electrical connectors extend through the bore. The support cap is disposed at a first end portion of the housing. The sensor is provided on the support cap and is electrically coupled to the pair of electrical connectors. The support cap is positioned between the pair of electrical connectors and the support cap.

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