Matthew Dugas - St. Paul MN, US Joseph Tersteeg - Columbia Heights MN, US
International Classification:
G11B005/127 H04R031/00 G11B005/187
US Classification:
029/603150, 029/603070, 360/122000, 428/900000
Abstract:
Double photolithography is used to produce an under-layer of protective and filtering photoresist over a substrate that will have channels milled with a FIB. Secondary layers are applied with precision on top of the first layer in order to define the precise patterns to be milled and to provide targeting and alignment fiducials.
Double Layer Patterning And Technique For Milling Patterns For A Servo Recording Head
Matthew Dugas - St. Paul MN, US Joseph Tersteeg - Columbia Heights MN, US
International Classification:
G11B 5/127 C23C 14/00 H04R 31/00
US Classification:
029603070, 204192340, 360122000, 029603120
Abstract:
Double photolithography is used to produce an under-layer of protective and filtering photoresist over a substrate that will have channels milled with a FIB. Secondary layers are applied with precision on top of the first layer in order to define the precise patterns to be milled and to provide targeting and alignment fiducials.