Kevin Patrick Cummings

US Patent:

6444398, Sep 3, 2002

Filed:

Jul 12, 2000

Appl. No.:

09/614828

Inventors:

Kevin David Cummings - Phoenix AZ

Assignee:

Motorola, Inc. - Schaumburg IL

International Classification:

G03F 720

US Classification:

430296, 430311, 430394, 430396, 430942, 2504922

Abstract:

A lithographic mask (FIG. or FIG. ) that is primarily used for SCALPEL processing has a substrate ( ). Layers ( , and ) are formed and selectively patterned and etched to form E-beam exposure windows ( ) and skirt regions ( ) framing the windows ( ). The skirt regions ( ) and some portions of the patterned features ( ) within the window ( ) are formed having thicker/thinner regions of material or formed of different material whereby different regions of the mask (FIG. ) scatter energy to differing degrees. The different scattering regions on the mask allow SCALPEL patterns to be formed on the wafer with improved critical dimension (CD) control, reduced aberrant feature formation, and improved yield.

US Patent:

6943941, Sep 13, 2005

Filed:

Feb 27, 2003

Appl. No.:

10/374509

Inventors:

Donis Flagello - Scottsdale AZ, US
Kevin Cummings - Phoenix AZ, US

Assignee:

ASML Netherlands B.V. - Veldhoven

International Classification:

G02B005/30
G02B027/28
G03B027/72

US Classification:

359352, 359486, 359495, 355 71

Abstract:

A radial transverse electric polarizer device is provided. The device includes a first layer of material having a first refractive index, a second layer of material having a second refractive index, and a plurality of elongated elements azimuthally and periodically spaced apart, and disposed between the first layer and the second layer. The plurality of elongated elements interact with electromagnetic waves of radiation to transmit transverse electric polarization of electromagnetic waves of radiation. One aspect of the invention is, for example, to use such polarizer device in a lithographic projection apparatus to increase imaging resolution. Another aspect is to provide a device manufacturing method including polarizing a beam of radiation in a transverse electric polarization.

US Patent:

6984261, Jan 10, 2006

Filed:

Feb 5, 2003

Appl. No.:

10/358856

Inventors:

Kevin M. Cummings - Little Canada MN, US
Jacqueline C. Rolf - River Falls WI, US
Anatoly Z. Rosenflanz - Maplewood MN, US
Richard P. Rusin - Woodbury MN, US
Jerome E. Swanson - St. Paul MN, US

Assignee:

3M Innovative Properties Company - St. Paul MN

International Classification:

A61K 6/00

US Classification:

106 35, 433 8, 433 9, 433 17, 433206, 433215, 433218, 4332011, 4332021, 4332221, 501153, 501152, 501127, 501105, 501 1, 501 2, 501 3, 501 4, 501 5, 501 6, 501 7, 501 8, 501 9, 501 10, 501 41, 501 42, 501 43, 501 44, 501 45, 501 46, 501 47, 501 48, 501 49, 501 50, 501 51, 501 52, 501 73, 501 74, 501 75, 501 76, 501 77, 501 78, 501 79

Abstract:

The invention relates to uses of glasses and glass-ceramics in dental and orthodontic applications.

US Patent:

7022173, Apr 4, 2006

Filed:

Dec 21, 2004

Appl. No.:

11/018125

Inventors:

Kevin M. Cummings - Little Canada MN, US
Jacqueline C. Rolf - River Falls WI, US
Anatoly Z. Rosenflanz - Maplewood MN, US
Richard P. Rusin - Woodbury MN, US
Jerome E. Swanson - St. Paul MN, US

Assignee:

3M Innovative Properties Company - St. Paul MN

International Classification:

A61K 6/027
A61K 6/08

US Classification:

106 35, 433 8, 4332281, 264 16, 523115, 523116, 523118

Abstract:

The invention relates to uses of glasses and glass-ceramics in dental and orthodontic applications.

US Patent:

7022436, Apr 4, 2006

Filed:

Jan 14, 2003

Appl. No.:

10/341385

Inventors:

Kevin Cummings - Phoenix AZ, US

Assignee:

ASML Netherlands B.V. - Veldhoven

International Classification:

G01F 9/00

US Classification:

430 5

Abstract:

Attenuating phase shift masks and alternating phase shift masks provide increased resolution of the apparatus by introducing a phase shift in the radiation transmitted between adjacent features of the pattern on the mask. A phase shift mask is provided with a layer of inorganic material that is etchable. The inorganic material layer is formed on a mask blank having a glass or quartz layer and an etch stop layer. The etch stop layer provides uniform etch depth of the pattern in the inorganic material layer as the etch stop layer is formed of a material that is not etched by the etching process. The phase shift mask may be provided with a layer of attenuating material instead of the resinous inorganic polymer layer. The features of the pattern of the phase shift mask may also be filled with an optically transparent or translucent material or with an opaque material having an index of refraction and a dielectric constant selected to reduce the boundary effect at side walls of features of the pattern. A device for use in an integrated circuit, an integrated optical system, magnetic domain memories, liquid-crystal display panels, and thin-film magnetic heads may be manufactured by exposing a radiation sensitive material on a substrate to a projection beam of radiation patterned with a phase shift mask having an etch stop layer and/or a pattern filled with optically transparent or translucent material or with an opaque material.

US Patent:

7022437, Apr 4, 2006

Filed:

Jan 15, 2003

Appl. No.:

10/342240

Inventors:

Kevin Cummings - Phoenix AZ, US

Assignee:

ASML Netherlands B.V. - Veldhoven

International Classification:

G03F 9/00

US Classification:

430 5

Abstract:

A patterning device, for example a mask, for use in a photolithographic apparatus includes a blank layer, a layer of patterned opaque material on a surface of the blank layer and a pellicle of perfluoropolyether (PFPE) liquid that covers the surface. A method of manufacturing a patterning device includes providing a patterning device having a blank layer and a patterned layer of opaque material on a surface of the blank layer, applying PFPE liquid to the surface that covers the surface to form a PFPE liquid layer, and removing at least a portion of the PFPE liquid layer. A method of cleaning a patterning device for use in photolithographic projection apparatus, the patterning device including a blank layer and a patterned layer of opaque material on a surface of the blank layer, the method including applying PFPE liquid to the surface of the blank layer that covers the surface to form a PFPE liquid layer and removing at least a portion of the PFPE liquid layer.

US Patent:

7206059, Apr 17, 2007

Filed:

Feb 26, 2004

Appl. No.:

10/786473

Inventors:

Donis George Flagello - Scottsdale AZ, US
Kevin Cummings - Phoenix AZ, US
Alexander Straaijer - Eindhoven, NL
Marcel Mathijs Theodore Marie Dierichs - Venlo, NL

Assignee:

ASML Netherlands B.V. - Veldhoven

International Classification:

G03B 27/72
G02B 5/30

US Classification:

355 71, 359352

Abstract:

A radial transverse electric polarizer device includes a substrate material having a first refractive index and a plurality of elongated azimuthally oriented elements coupled to the substrate material, the plurality of elongated elements having a second refractive index. The plurality of elements are periodically spaced apart to form a plurality of gaps such that the radial transverse electric polarizer device interacts with an electromagnetic radiation including first and second polarizations to reflect substantially all of the radiation of the first polarization and transmit substantially all of the radiation of the second polarization. The plurality of elongated elements are coated with this thin layer of absorbing material which absorbs radiation at a wavelength of the electromagnetic radiation. The polarizer device may be used, for example, in a lithographic projection apparatus to increase imaging resolution.

US Patent:

7221501, May 22, 2007

Filed:

Apr 15, 2005

Appl. No.:

11/106480

Inventors:

Donis Flagello - Scottsdale AZ, US
Kevin Cummings - Phoenix AZ, US
Alexander Straaijer - Eindhoven, NL

Assignee:

ASML Netherlands B.V. - Veldhoven

International Classification:

G02B 5/30
G02B 27/28
G02B 27/72

US Classification:

359352, 359486, 359495, 355 71

Abstract:

A radial transverse electric polarizer device is provided. The device includes a first layer of material having a first refractive index, a second layer of material having a second refractive index, and a plurality of elongated elements azimuthally and periodically spaced apart, and disposed between the first layer and the second layer. The plurality of elongated elements interact with electromagnetic waves of radiation to transmit transverse electric polarization of electromagnetic waves of radiation. One aspect of the invention is, for example, to use such polarizer device in a lithographic projection apparatus to increase imaging resolution. Another aspect is to provide a device manufacturing method including polarizing a beam of radiation in a transverse electric polarization.