Kirill Y Sobolev

US Patent:

20080198354, Aug 21, 2008

Filed:

Feb 20, 2007

Appl. No.:

11/708131

Inventors:

Stanislav Y. Smirnov - Bethel CT, US
Kirill Y. Sobolev - Bethel CT, US

International Classification:

G03B 27/54

US Classification:

355 67, 355 53

Abstract:

An illuminator for a lithography system is provided. The illuminator includes a mask positioned along an optical axis and first and second refractive groupings positioned along the axis in cooperative arrangement with the mask. Also included are first and second reflecting devices for reflecting an image output from the first and second refractive groupings and a spatial light modulator (SLM) positioned along the axis in cooperative arrangement with the first and second reflecting devices. The active areas of the mask and the SLM are positioned off-axis.

US Patent:

20220179331, Jun 9, 2022

Filed:

Mar 25, 2020

Appl. No.:

17/600174

Inventors:

- Veldhoven, NL
Justin Lloyd KREUZER - Trumbull CT, US
Yuxiang LIN - Wilton CT, US
Kirill Urievich SOBOLEV - Brookfield CT, US

Assignee:

ASML HOLDING N.V. - Veldhoven

International Classification:

G03F 9/00

Abstract:

Apparatus for, and method of, measuring a parameter of an alignment mark on a substrate in which an optical system is arranged to receive at least one diffraction order from the alignment mark and the diffraction order is modulated at a pupil or a wafer conjugate plane of the optical system, a solid state optical device is arranged to receive the modulated diffraction order, and a spectrometer is arranged to receive the modulated diffraction order from the solid state optical device and to determine an intensity of one or more spectral components in the modulated diffraction order.

US Patent:

20230055116, Feb 23, 2023

Filed:

Jan 21, 2021

Appl. No.:

17/794905

Inventors:

- Veldhoven, NL
Christopher Michael DOHAN - Redding CT, US
Justin Lloyd KREUZER - Trumbull CT, US
Michal Emanuel PAWLOWSKI - Norwalk CT, US
Aage BENDIKSEN - Fairfield CT, US
Kirill Urievich SOBOLEV - Brookfield CT, US
James Hamilton WALSH - Newtown CT, US
Roberto B. WIENER - Ridgefield CT, US
Arun Mahadevan VENKATARAMAN - Wilton CT, US

Assignee:

ASML Holding N.V. - Veldhoven

International Classification:

G03F 1/84

Abstract:

An inspection system includes a radiation source that generates a beam of radiation and irradiates a first surface of an object, defining a region of the first surface of the object. The radiation source also irradiates a second surface of the object, defining a region of the second surface, wherein the second surface is at a different depth level within the object than the first surface. The inspection system may also include a detector that defines a field of view (FOV) of the first surface including the region of the first surface, and receives radiation scattered from the region of the first surface and the region of the second surface. The inspection system may also include a processor that discards image data not received from the region of the first surface, and constructs a composite image comprising the image data from across the region of the first surface.

US Patent:

20180341105, Nov 29, 2018

Filed:

Nov 21, 2016

Appl. No.:

15/777908

Inventors:

- Veldhoven, NL
Kirill Urievich SOBOLEV - Brookfield CT, US

Assignee:

ASML HOLDING N.V. - Veldhoven

International Classification:

G02B 27/00
G02B 17/02
G03F 9/00
G03F 7/20
G01B 11/27
G01B 9/02

Abstract:

An alignment system uses a self-referencing interferometer that incorporates an objective lens system having a plurality of lens element groups. In an embodiment, the objective is configured and arranged to provide a large numerical aperture, long working distance, and low wavefront error.