Michael V Liang

US Patent:

20020102405, Aug 1, 2002

Filed:

Jul 17, 2001

Appl. No.:

09/907551

Inventors:

Robert Chapman - Burlingame CA, US
Emanuele Ostuni - Cambridge MA, US
Michael Liang - Somerville MA, US
Lin Yan - East Brunswick NJ, US
George Whitesides - Newton MA, US

International Classification:

B32B009/04
B32B017/06
B32B013/04
B32B015/04
B32B027/00

US Classification:

428/411100, 428/426000, 428/446000, 428/457000, 428/500000

Abstract:

The present invention provides articles resistant to the adsorption of proteins, cells and bacteria. The articles can either have a chemical chain bonded thereon where the chemical chain can comprise a terminal group free of a hydrogen bond donor or where a hydrogen bond donor is sufficiently buried such that an exposed surface of the article including the chemical chain is free of a hydrogen bond donor. The chemical chain, or plurality of chemical chains, can comprise a monolayer such as a self-assembled monolayer (SAM) which can be homogeneous (one type of SAM) or mixed, i.e. or more different types of SAMs. Other more specific examples of chemical chains are provided. The plurality of chemical chains can comprise a polymer such as a polyamine. In many aspects, the plurality of chemical chains is sufficiently free of cross-linking or branching. The present invention also provides an article capable of specific binding of a desired biomolecule while preventing non-specific binding of biomolecules.

US Patent:

20230077652, Mar 16, 2023

Filed:

Sep 6, 2022

Appl. No.:

17/903847

Inventors:

- Santa Clara CA, US
Michael LIANG - Santa Clara CA, US
Jeffrey A. KHO - Monte Sereno CA, US
Kwang Soo HUH - Palo Alto CA, US

International Classification:

H01J 37/32
C23C 16/455
C23C 16/56

Abstract:

Embodiments described herein provide a chamber having a gas flow inlet guide to uniformly deliver process gas. The gas flow inlet guide having a flow guide bottom plate having an opening. A top plate is disposed over the flow guide bottom plate and a plasma blocker is disposed over the opening. The plasma blocker includes one or more apertures sized based one or more of a plasma density, an electron temperature, an ion temperature, or a characteristic of a process gas.