Paul E Stoft

US Patent:

40701174, Jan 24, 1978

Filed:

Jan 21, 1976

Appl. No.:

5/650976

Inventors:

Karl-Heinz Johannsmeier - Mountain View CA
Paul E. Stoft - Menlo Park CA
Tor G. Larsen - Cupertino CA

Assignee:

Kasper Instruments, Inc. - Sunnyvale CA

International Classification:

G06F 1546
H05K 1300

US Classification:

356172

Abstract:

An apparatus for automatically aligning a semiconductor wafer with a mask in the manufacture of integrated circuit devices is disclosed. The mask and wafer are each provided with alignment patterns, the alignment pattern on the wafer cooperating with the alignment pattern on the mask in a unique visual manner to signify alignment. A scanning mechanism is provided for automatically scanning the alignment pattern areas and producing output signals indicative of the relative positions of the alignment patterns on the wafer and mask. Logic circuitry is provided for operating in response to any misalignment represented by the scan output signals to compute formulae which are utilized to produce control signals for driving motor drive mechanisms to produce relative movement between the mask and wafer to bring them into alignment. Several separate alignment cycles are provided, if needed, for zeroing in on finalized alignment. A tolerance selection control circuit is provided for permitting a variation in final alignment tolerance.

US Patent:

40893367, May 16, 1978

Filed:

Dec 20, 1974

Appl. No.:

5/534756

Inventors:

John M. Cage - Los Altos CA
Robert F. Shaw - San Francisco CA
Paul E. Stoft - Menlo Park CA

International Classification:

A61B 1732
A61N 300

US Classification:

1283031

Abstract:

A surgical cutting instrument includes an electrically heated cutting edge and an automatic control system for maintaining the cutting edge at a constant high temperature for sterilizing the blade, cutting tissue, and cauterizing the incised tissue to reduce hemorrhage from the cut surfaces of the tissues (hemostasie).

US Patent:

39873030, Oct 19, 1976

Filed:

Feb 6, 1975

Appl. No.:

5/547670

Inventors:

Paul E. Stoft - Menlo Park CA
John A. Bridgham - Palo Alto CA
Robert L. Chaney - Cupertino CA
Charles M. Hill - Los Altos CA
John K. D. Lazier - Palo Alto CA
Barry G. Willis - Palo Alto CA
Jacob Y. Wong - Framingham MA
Moshe A. Fostick - San Francisco CA

Assignee:

Hewlett-Packard Company - Palo Alto CA

International Classification:

G21F 302
G21K 300
G01N 2134

US Classification:

250343

Abstract:

A gas analyzer is provided which is particularly suited for making transcutaneous measurement of the CO. sub. 2 concentration in the blood. In accordance with one embodiment of the invention, sample gases from the body are circulated in a cavity of the device. A rotating wheel in the cavity includes two reference cells and a sample cell which are sequentially rotated into the optical path between a source and a detector. Three signals are thereby provided which may be combined to give an output indication of the CO. sub. 2 concentration in the body fluids. In a preferred embodiment, the sample cell is an "inverted cell" being in open communication with the sample gas circulating in the device so that the gas in the sample cell is a portion of the circulating gas which also surrounds the two reference cells. An output indication is thereby obtained which is insensitive to contaminants in the sample. In accordance with another embodiment, the sample cell is isolated from the region surrounding the wheel and positioned so as to be presented in series with the reference cells in the optical detection path.

US Patent:

42590191, Mar 31, 1981

Filed:

Oct 4, 1977

Appl. No.:

5/839324

Inventors:

Karl-Heinz Johannsmeier - Mountain View CA
Paul E. Stoft - Menlo Park CA
Tor G. Larsen - Cupertino CA

Assignee:

Kasper Instruments, Inc. - Sunnyvale CA

International Classification:

G06F 1546
H05K 1300

US Classification:

356400

Abstract:

An apparatus for automatically aligning a semiconductor wafer with a mask in the manufacture of integrated circuit devices is disclosed. The mask and wafer are each provided with alignment patterns, the alignment pattern on the wafer cooperating with the alignment pattern on the mask in a unique visual manner to signify alignment. A scanning mechanism is provided for automatically scanning the alignment pattern areas and producing output signals indicative of the relative positions of the alignment patterns on the wafer and mask. Logic circuitry is provided for operating in response to any misalignment represented by the scan outout signals to compute formulae which are utilized to produce control signals for driving motor drive mechanisms to produce relative movement between the mask and wafer to bring them into alignment. Several separate alignment cycles are provided, if needed, for zeroing in on finalized alignment. A tolerance selection control circuit is provided for permitting a variation in final alignment tolerance.

US Patent:

39550729, May 4, 1976

Filed:

Jun 12, 1972

Appl. No.:

5/305861

Inventors:

Karl-Heinz Johannsmeier - Los Altos CA
Paul E. Stoft - Menlo Park CA
Tor G. Larsen - Saratoga CA

Assignee:

Kasper Instruments, Inc. - Mountain View CA

International Classification:

G06F 1546
H05K 1300

US Classification:

23515111

Abstract:

An apparatus for automatically aligning a semiconductor wafer with a mask in the manufacture of integrated circuit devices is disclosed. The mask and wafer are each provided with alignment patterns, the alignment pattern on the wafer cooperating with the alignment pattern on the mask in a unique visual manner to signify alignment. A scanning mechanism is provided for automatically scanning the alignment pattern areas and producing output signals indicative of the relative positions of the alignment patterns on the wafer and mask. Logic circuitry is provided for operating in response to any misalignment represented by the scan output signals to compute formulae which are utilized to produce control signals for driving motor drive mechanisms to produce relative movement between the mask and wafer to bring them into alignment. Several separate alignment cycles are provided, if needed, for zeroing in on finalized alignment. A tolerance selection control circuit is provided for permitting a variation in final alignment tolerance.

US Patent:

41989570, Apr 22, 1980

Filed:

Mar 22, 1977

Appl. No.:

5/780031

Inventors:

John M. Cage - Los Altos CA
Robert F. Shaw - San Francisco CA
Paul E. Stoft - Menlo Park CA

International Classification:

A61B 1732

US Classification:

128 1R

Abstract:

A surgical cutting instrument includes an electrically heated cutting edge and an automatic control system for maintaining the cutting edge at a constant high temperature for sterilizing the blade, cutting tissue, and cauterizing the incised tissue to reduce hemorrhage from the cut surfaces of the tissues (hemostasis).

US Patent:

40754812, Feb 21, 1978

Filed:

Jun 14, 1976

Appl. No.:

5/695339

Inventors:

Paul E. Stoft - Menlo Park CA
John A. Bridgham - Palo Alto CA
Robert L. Chaney - Cupertino CA
Charles M. Hill - Los Altos CA
John K. D. Lazier - Palo Alto CA
Barry G. Willis - Palo Alto CA
Jacob Y. Wong - Framingham MA
Moshe A. Fostick - San Francisco CA

Assignee:

Hewlett-Packard Company - Palo Alto CA

International Classification:

G21F 302
G21K 300
G01N 2134

US Classification:

250343

Abstract:

A gas analyzer is provided which is particularly suited for making transcutaneous measurement of the CO. sub. 2 concentration in the blood. In accordance with one embodiment of the invention, sample gases from the body are circulated in a cavity of the device. A rotating wheel in the cavity includes two reference cells and a sample cell which are sequentially rotated into the optical path between a source and a detector. Three signals are thereby provided which may be combined to give an output indication of the CO. sub. 2 concentration in the body fluids. In a preferred embodiment, the sample cell is an "inverted cell" being in open communication with the sample gas circulating in the device so that the gas in the sample cell is a portion of the circulating gas which also surrounds the two reference cells. An output indication is thereby obtained which is insensitive to contaminants in the sample. In accordance with another embodiment, the sample cell is isolated from the region surrounding the wheel and positioned so as to be presented in series with the reference cells in the optical detection path.

US Patent:

44088850, Oct 11, 1983

Filed:

Jan 13, 1981

Appl. No.:

6/224915

Inventors:

Karl-Heinz Johannsmeier - Mountain View CA
Paul E. Stoft - Menlo Park CA
Tor G. Larsen - Cupertino CA

Assignee:

Kasper Instruments, Inc. - Sunnyvale CA

International Classification:

G01B 1100
G06F 1546

US Classification:

356401

Abstract:

An apparatus for automatically aligning a semiconductor wafer with a mask in the manufacture of integrated circuit devices is disclosed. The mask and wafer are each provided with alignment patterns, the alignment pattern on the wafer cooperating with the alignment pattern on the mask in a unique visual mannner to signify alignment. A scanning mechanism is provided for automatically scanning the alignment pattern areas and producing output signals indicative of the relative positions of the alignment patterns on the wafer and mask. Logic circuitry is provided for operating in response to any misalignment represented by the scan output signals to compute formulae which are utilized to produce control signals for driving motor drive mechanisms to produce relative movement between the mask and wafer to bring them into alignment. Several separate alignment cycles are provided, if needed, for zeroing in on finalized alignment. A tolerance selection control circuit is provided for permitting a variation in final alignment tolerance.