Peter M Gulvin

US Patent:

6465856, Oct 15, 2002

Filed:

Mar 19, 2001

Appl. No.:

09/812498

Inventors:

Peter M. Gulvin - Webster NY
Jingkuang Chen - Rochester NY

Assignee:

Xerox Corporation - Stamford CT

International Classification:

H01L 2982

US Classification:

257422, 257414, 257421

Abstract:

A microstructure that may be used as an electrical connection in a microfabricated electro-mechanical system (MEMS) apparatus. The microstructure may have one or more isolatable electrical connections for signal transmission. The microstructure allows a MEMS apparatus to shield signal transmissions from the effects of electromagnetic interference or conductive fluids.

US Patent:

6467879, Oct 22, 2002

Filed:

Oct 16, 2000

Appl. No.:

09/687096

Inventors:

Joel A. Kubby - Rochester NY
Elliott A. Eklund - Penfield NY
Peter M. Gulvin - Webster NY

Assignee:

Xerox Corporation - Stamford CT

International Classification:

B41J 204

US Classification:

347 54

Abstract:

A micro-electromechanical fluid ejector having an inner structure on the bottom of the top of the membrane for isolating the conductor, and an outer structure, away from the center of the membrane, on the bottom of the top of the membrane to stop excessive flexing of the membrane leading to inter-electrode contact.

US Patent:

6479311, Nov 12, 2002

Filed:

Nov 27, 2000

Appl. No.:

09/724506

Inventors:

Bruce R. Scharf - Seattle WA
Joel A. Kubby - Rochester NY
Jingkuang Chen - Rochester NY
Peter M. Gulvin - Webster NY
Chuang-Chia Lin - San Pablo CA
Alex T. Tran - Ithaca NY

Assignee:

Microscan Systems, Inc. - Renton WA
Xerox Corporation - Stamford CT

International Classification:

H01L 2100

US Classification:

438 22, 359566

Abstract:

The present invention provides a micromechanical or microoptomechanical structure. The structure is produced by a process comprising defining a pattern on a single crystal silicon layer separated by an insulator layer from a substrate layer; defining a structure in the single-crystal silicon layer; depositing and etching a polysilicon layer on the single crystal silicon layer, with remaining polysilcon forming mechanical or optical elements of the structure; and releasing the formed structure.

US Patent:

6479315, Nov 12, 2002

Filed:

Nov 27, 2000

Appl. No.:

09/724514

Inventors:

Andrew J. Zosel - Covington WA
Peter M. Gulvin - Webster NY
Jingkuang Chen - Rochester NY
Joel A. Kubby - Rochester NY
Chuang-Chia Lin - San Pablo CA
Alex T. Tran - Ithaca NY

Assignee:

Microscan Systems, Inc. - Renton WA
Xerox Corporation - Stamford CT

International Classification:

H01L 2100

US Classification:

438 69, 438 51, 438 59, 438 65, 438 66, 216 2

Abstract:

The present invention provides a micromechanical or microoptomechanical structure. The structure is produced by a process comprising defining a structure on a single crystal silicon layer separated by an insulator layer from a substrate layer; depositing and etching a polysilicon layer on the single crystal silicon layer, with remaining polysilicon forming mechanical or optical elements of the structure; exposing a selected area of the single crystal silicon layer; and releasing the formed structure.

US Patent:

6506620, Jan 14, 2003

Filed:

Nov 27, 2000

Appl. No.:

09/724515

Inventors:

Bruce R. Scharf - Seattle WA
Joel A. Kubby - Rochester NY
Chuang-Chia Lin - San Pablo CA
Alex T. Tran - Ithaca NY
Andrew J. Zosel - Covington WA
Peter M. Gulvin - Webster NY
Jingkuang Chen - Rochester NY

Assignee:

Microscan Systems Incorporated - Renton WA
Xerox Corporation - Stamford CT

International Classification:

H01L 2100

US Classification:

438 52, 438 29, 438 32, 438 50

Abstract:

The present invention provides a micromechanical or microoptomechanical structure produced by a process comprising defining the structure in a single-crystal silicon layer separated by an insulator layer from a substrate layer; selectively etching the single crystal silicon layer; depositing and etching a polysilicon layer on the insulator layer, with remaining polysilicon forming mechanical elements of the structure; metalizing a backside of the structure; and releasing the formed structure.

US Patent:

6508947, Jan 21, 2003

Filed:

Jan 24, 2001

Appl. No.:

09/768688

Inventors:

Peter M. Gulvin - Webster NY
Elliott A. Eklund - Penfield NY

Assignee:

Xerox Corporation - Stamford CT

International Classification:

H01L 2100

US Classification:

216 27, 216 2, 438719, 438745

Abstract:

A method for fabricating a membrane having a corrugated, multi-layer structure, comprising the steps of: providing a substrate having an insulator layer on the top surface of the substrate, a conductive layer on the insulator layer, a sacrificial layer on said conductive layer, and a second conductive layer; patterning a series of holes the second conductive layer to allow release etchant to have access to a second sacrificial layer; depositing the second sacrificial layer onto said second conductive layer so that the series of holes are filled with the second sacrificial layer; patterning the second sacrificial layer with a radial and/or concentric grid pattern so that a third conductive layer when deposited will form the support structure and top portion of the corrugated structure; depositing the third conductive layer so that the grid pattern is filled in and is in contact with the second conductive layer; removing the first and second sacrificial layer by immersing the device in a release etchant.

US Patent:

6510275, Jan 21, 2003

Filed:

Nov 8, 2001

Appl. No.:

09/986399

Inventors:

Alex Tran - Madison NJ
Joel A. Kubby - Rochester NY
Jingkuang Chen - Rochester NY
Peter Gulvin - Webster NY
Kathleen A. Feinberg - Rochester NY
Yi Su - Portland OR

Assignee:

Xerox Corporation - Stamford CT

International Classification:

G02B 600

US Classification:

385139, 385 88, 385 14, 385 37

Abstract:

A micro-optoelectromechanical system based device with aligned structures comprises at least one optical structure formed in a silicon layer of the device and at least one optical fiber connection structure that is self-aligned with the at least one optical structure. In embodiments, the at least one optical fiber connection structure is formed in a substrate of the device and may comprise a V-groove. In other embodiments, the at least one optical structure may comprise a waveguide. A nitride layer may be formed on at least a portion of the waveguide. In various embodiments, the silicon layer may be a single-crystal-silicon layer of a silicon-on-insulator wafer. A method for fabricating a micro-optoelectromechanical system based device with aligned structures is provided in which the at least one optical structure and the at least one optical fiber connection structure are defined using the same masking layer.

US Patent:

6572218, Jun 3, 2003

Filed:

Jan 24, 2001

Appl. No.:

09/768676

Inventors:

Peter M. Gulvin - Webster NY
Elliott A. Eklund - Penfield NY

Assignee:

Xerox Corporation - Stamford CT

International Classification:

B41J 204

US Classification:

347 54

Abstract:

A micro-electromechanical fluid ejector including a substrate having an insulating layer thereon; a conductor formed on said insulating layer; a membrane adjacent to said conductor, said membrane having a corrugated, multi-layer structure for added rigidity; and an actuator chamber formed between said membrane and said conductor, said membrane flexing toward said conductor when a voltage bias is applied thereto.