Peter J Matsuo

US Patent:

7359952, Apr 15, 2008

Filed:

Aug 25, 2003

Appl. No.:

10/647832

Inventors:

Marcus F. Doemling - Lake Hiawatha NJ, US
Peter J. Matsuo - Albany NY, US

Assignee:

Yahoo! Inc. - Sunnyvale CA

International Classification:

G06F 15/16

US Classification:

709217, 709203

Abstract:

A method for limiting the delivery of content, particularly advertisements intended to be displayed in a communications network environment, to individual recipients based on frequency considerations, including a method for storing statistical data relevant to making a determination about the limiting of content delivery and a method for providing alternate content in case it is decided that the original content should not be delivered to a recipient.

US Patent:

20020112033, Aug 15, 2002

Filed:

Aug 8, 2001

Appl. No.:

09/924808

Inventors:

Marcus Doemling - Lake Hiawatha NJ, US
Peter Matsuo - Troy NY, US

International Classification:

G06F015/16

US Classification:

709/219000, 709/203000

Abstract:

A system and method for enhancing content downloaded to client. Included is an enhancement mechanism that can be transferred to a client along with a web page or other web resource. The enhancement mechanism causes content to be retrieved and output in an enhanced fashion at the client.

US Patent:

20050038700, Feb 17, 2005

Filed:

Aug 11, 2004

Appl. No.:

10/915910

Inventors:

Marcus Doemling - Lake Hiawatha NJ, US
Peter Matsuo - Albany NY, US

International Classification:

G06F017/60

US Classification:

705014000, 705026000, 705027000

Abstract:

A system and method for the development of online advertisements that are built up of a plurality of components and computer file format types, whose interactions, positioning, and other characteristics are flexibly defined and/or modified through a user interface.

US Patent:

6060400, May 9, 2000

Filed:

Mar 26, 1998

Appl. No.:

9/048848

Inventors:

Gottlieb S. Oehrlein - Voorheesville NY
Bernd Kastenmeier - Albany NY
Peter Matsuo - Albany NY

Assignee:

The Research Foundation of State University of New York - Albany NY

International Classification:

H01L 213065

US Classification:

438706

Abstract:

A dry etch process is described for removing silicon nitride masks from silicon dioxide or silicon for use in a semiconductor fabrication process. A remote plasma oxygen/nitrogen discharge is employed with small additions of a fluorine source. The gas mixture is controlled so that atomic fluorine within the reaction chamber is maintained at very low flows compared with the oxygen and nitrogen reactants. Parameters are controlled so that an oxidized reactive layer is formed above any exposed silicon within a matter of seconds from initiating etching of the silicon nitride. Etch rates of silicon nitride to silicon of greater than 30:1 are described, as well as etch rates of silicon nitride to silicon dioxide of greater than 70:1.

Address:

134 Factory Holw Rd, Valley Falls, NY 12185

Phone:

5182480257

VIN:

WBANN73507CN04724

Make:

BMW

Model:

5 SERIES

Year:

2007