Samuel S Pak

US Patent:

7897525, Mar 1, 2011

Filed:

Dec 31, 2008

Appl. No.:

12/319231

Inventors:

Lawrence Chung-Lai Lei - Milpitas CA, US
Alfred Mak - Fremont CA, US
Rex Liu - Castro Valley CA, US
Kon Park - Livermore CA, US
Samuel S. Pak - San Ramon CA, US
Tzy-Chung Terry Wu - Palo Alto CA, US
Simon Zhu - Sunnyvale CA, US
Ronald L. Rose - San Jose CA, US
Gene Shin - San Jose CA, US
Xiaoming Wang - San Jose CA, US

Assignee:

Archers Inc. - Gerogetown, Grand Cayman

International Classification:

H01L 21/00

US Classification:

438800, 414935

Abstract:

In accordance with some embodiments described herein, a method for transferring a substrate to two or more process modules is provided, comprising loading at least one substrate into one or more mobile transverse chambers, the mobile transverse chambers being carried on a rail positioned adjacent to the two or more process modules, and wherein each mobile transverse chamber is configured to maintain a specified gas condition during conveyance of the substrate. One or more drive systems are actuated to propel at least one of the one or more mobile transverse chambers along the rail. The at least one mobile transfer chamber docks to at least one of the process modules, and the substrate is conveyed from the mobile transverse chamber to the at least one process modules.

US Patent:

8268734, Sep 18, 2012

Filed:

Mar 1, 2011

Appl. No.:

13/038309

Inventors:

Lawrence Chung-Lai Lei - Milpitas CA, US
Alfred Mak - Fremont CA, US
Rex Liu - Castro Valley CA, US
Kon Park - Livermore CA, US
Samuel S. Pak - San Ramon CA, US
Tzy-Chung Terry Wu - Palo Alto CA, US
Simon Zhu - Sunnyvale CA, US
Ronald L. Rose - San Jose CA, US
Gene Shin - San Jose CA, US
Xiaoming Wang - San Jose CA, US

Assignee:

Archers Inc. - Georgetown

International Classification:

H01L 21/00

US Classification:

438800, 414935

Abstract:

In accordance with some embodiments described herein, a method for transferring a substrate to two or more process modules is provided, comprising loading at least one substrate into one or more mobile transverse chambers, the mobile transverse chambers being carried on a rail positioned adjacent to the two or more process modules, and wherein each mobile transverse chamber is configured to maintain a specified gas condition during conveyance of the substrate. One or more drive systems are actuated to propel at least one of the one or more mobile transverse chambers along the rail. The at least one mobile transfer chamber docks to at least one of the process modules, and the substrate is conveyed from the mobile transverse chamber to the at least one process modules.

US Patent:

8367565, Feb 5, 2013

Filed:

Dec 20, 2010

Appl. No.:

12/973736

Inventors:

Lawrence Chung-Lai Lei - Milpitas CA, US
Alfred Mak - Fremont CA, US
Rex Liu - Castro Valley CA, US
Kon Park - Livermore CA, US
Samuel S. Pak - San Ramon CA, US
Tzy-Chung Terry Wu - Palo Alto CA, US
Simon Zhu - Sunnyvale CA, US
Ronald L. Rose - San Jose CA, US
Gene Shin - San Jose CA, US
Xiaoming Wang - San Jose CA, US

Assignee:

Archers Inc. - Georgetown

International Classification:

H01L 21/00

US Classification:

438800, 414935

Abstract:

In accordance with some embodiments described herein, a method for transferring a substrate is provided. The method includes loading one or more substrates into a respective mobile chamber of one or more mobile chambers. The mobile chambers are movable on a first rail positioned adjacent to two or more process modules. Each mobile chamber is configured to maintain a specified gas condition. The respective mobile chamber is moved along the first rail. The respective mobile chamber is docked to a respective process module of the two or more process modules. At least one of the one or more substrates is conveyed from the respective mobile chamber to the respective process module.

US Patent:

20070231109, Oct 4, 2007

Filed:

Mar 28, 2007

Appl. No.:

11/692850

Inventors:

Samuel S. Pak - San Ramon CA, US
Christopher C. Chang - Brentwood CA, US

International Classification:

H01L 21/677

US Classification:

414217

Abstract:

An apparatus and method for processing substrates uses one or more vacuum transfer chamber units to transfer some of the substrates between at least one load lock chamber unit and at least one vacuum process chamber unit.

US Patent:

20100162955, Jul 1, 2010

Filed:

Dec 31, 2008

Appl. No.:

12/319225

Inventors:

Lawrence Chung-Lai Lei - Milpitas CA, US
Alfred Mak - Fremont CA, US
Rex Liu - Castro Valley CA, US
Kon Park - Livermore CA, US
Samuel S. Pak - San Ramon CA, US
Ying Tsong Loh - San Jose CA, US
Tzy-Chung Terry Wu - Palo Alto CA, US
Simon Zhu - Sunnyvale CA, US
Roland L. Rose - San Jose CA, US
Gene Shin - San Jose CA, US
Xiaoming Wang - San Jose CA, US

International Classification:

H01L 21/677
C23C 16/00
C23C 16/50
C23C 16/458

US Classification:

118723 R, 118715, 118724, 118 50, 118500, 4142171, 414805

Abstract:

In accordance with some embodiments described herein, a system for processing substrates includes two or more process modules, a substrate handling robot, a load lock chamber, and a transverse substrate handler. The transverse substrate handler includes mobile transverse chambers configured to convey substrates to process modules, wherein each mobile transverse chamber is configured to maintain a specified gas condition during the conveyance of the substrates. The transverse substrate handler further includes a rail for supporting the mobile transverse chambers, wherein the rail is positioned adjacent to entry of the process modules, and drive systems for moving the mobile transverse chambers on the rail.

US Patent:

20160340779, Nov 24, 2016

Filed:

Aug 2, 2016

Appl. No.:

15/226857

Inventors:

- Fremont CA, US
Samuel S. Pak - San Ramon CA, US
Hyoseok Yang - Sunnyvale CA, US
Sang In Lee - Los Altos Hills CA, US

International Classification:

C23C 16/44
C23C 16/452
H01J 37/32
C23C 16/50

Abstract:

A radical reactor including an elongated structure received within a chamber of a body of the radical reactor. Radicals are generated within a radical chamber formed in the elongated structure by applying a voltage signal across the elongated structure and an electrode extending within the radical chamber. The radicals generated in the radical chamber are routed via a discharge port of the elongated structure and a conduit formed in the body of the radical reactor onto the substrate. The discharge port and the conduit are not aligned so that irradiation generated in the radical chamber is not directed to the substrate

US Patent:

20150259793, Sep 17, 2015

Filed:

Mar 11, 2015

Appl. No.:

14/645258

Inventors:

- Fremont CA, US
Samuel S. Pak - San Ramon CA, US
Daniel Ho Lee - Burlingame CA, US
Hyoseok Daniel Yang - Cupertino CA, US

International Classification:

C23C 16/44
H01J 37/32
C23C 16/455

Abstract:

Embodiments relate to a deposition device that operates in two modes: a deposition mode, and a cleaning mode. In the deposition mode, modular injectors inject materials onto a substrate to form a layer. In the cleaning mode, the deposition device is cleaned without disassembly by injecting a cleaning gas. The injector module assembly may be cleaned in the cleaning mode by injecting cleaning gas through an exhaust for removing reactant precursor and routing the cleaning gas from the exhaust to another exhaust for removing source precursor. Alternatively, the injector module assembly is cleaned by injecting cleaning gas into a passage between an injector for injecting a source precursor and another injector for injecting a reactant precursor, and routing the cleaning gas to one of the exhausts in the cleaning mode.

US Patent:

20150218698, Aug 6, 2015

Filed:

Jan 23, 2015

Appl. No.:

14/604332

Inventors:

- Fremont CA, US
Suk Yal Cha - San Jose CA, US
Seung Yeop Baek - Taean-gun, KR
Daniel H. Lee - Burlingame CA, US
Samuel S. Pak - San Ramon CA, US
Daniel Yang - Cupertino CA, US
Sang In Lee - Los Altos Hills CA, US

International Classification:

C23C 16/455
C23C 16/458

Abstract:

Embodiments relate to performing deposition of material on a substrate by causing short-distance reciprocating motions of the substrate. A series of reactors for injecting material onto the substrate is arranged along the length of the substrate in a repeating manner. During each reciprocating motion, the susceptor moves a distance shorter than an entire length of the substrate. Portions of the substrate are injected with materials by a subset of reactors. Since the movement of the substrate is smaller, a linear deposition device including the susceptor may be made smaller.