Suzanne S Coley

US Patent:

6773872, Aug 10, 2004

Filed:

Dec 27, 2001

Appl. No.:

10/034756

Inventors:

Dana A. Gronbeck - Holliston MA
Suzanne Coley - Mansfield MA
Chi Q. Truong - Westboro MA
Ashish Pandya - Natick MA

Assignee:

Shipley Company, L.L.C. - Marlborough MA

International Classification:

G03F 7038

US Classification:

430326, 430325, 430905, 430910, 4302721, 430313, 430318, 430311

Abstract:

The present invention provides polymers which are substantially or completely free of inorganic contaminants and the use of such polymers as a resin component for photoresist compositions, particularly chemically-amplified positive-acting resists. Polymers of the invention also are suitable for use as a resin component for antireflective coating compositions (ARCs). More particularly, the invention provides methods for reducing such contaminants in polymerization initiators, particularly free radical initiators.

US Patent:

6855466, Feb 15, 2005

Filed:

Sep 15, 2001

Appl. No.:

09/952880

Inventors:

Edward K. Pavelchek - Stow MA, US
Timothy G. Adams - Sudbury MA, US
Manuel doCanto - Stoughton MA, US
Suzanne Coley - Mansfield MA, US
George G. Barclay - Jefferson MA, US

Assignee:

Shipley Company, L.L.C. - Marlborough MA

International Classification:

G03F007/00

US Classification:

430 14, 430 9, 430 18, 430290, 430950

Abstract:

The present invention provides new light absorbing compositions suitable for use as antireflective coating compositions (“ARCs”), including for deep UV applications. The antireflective compositions of the invention are particularly useful where a planarizing coating layer is required. ARCs of the invention contain a low molecular weight resin, a plasticizer compound and/or a low Tg resin. The invention also includes methods for applying forming planarizing ARC coating layers.

US Patent:

8501383, Aug 6, 2013

Filed:

May 18, 2010

Appl. No.:

12/782350

Inventors:

Anthony Zampini - Westborough MA, US
Vipul Jain - Westborough MA, US
Cong Liu - Shrewsbury MA, US
Suzanne Coley - Mansfield MA, US

Assignee:

Rohm and Haas Electronic Materials LLC - Marlborough MA

International Classification:

G03F 7/004
C07D 251/34
C08G 73/08

US Classification:

4302701, 4302711, 430927, 528367, 528289

Abstract:

Cyanurate compositions are provided that are particularly useful as a reagent to form a resin component of a coating composition underlying an overcoated photoresist. Preferred isocyanurates compound comprise substitution of multiple cyanurate nitrogen ring atoms by at least two distinct carboxy and/or carboxy ester groups.

US Patent:

20030232273, Dec 18, 2003

Filed:

Oct 9, 2002

Appl. No.:

10/268063

Inventors:

Timothy Adams - Sudbury MA, US
Suzanne Coley - Mansfield MA, US

Assignee:

Shipley Company, L.L.C. - Marlborough MA

International Classification:

G03F007/038
G03C001/492
G03C001/76

US Classification:

430/270100, 430/326000

Abstract:

The invention includes polymers that contain an alicyclic group (cage group) and acetal group which can undergo a deblocking reaction in the presence of photogenerated acid. The invention also provides photoresists that contain such polymers, particularly for imaging at short wavelengths such as sub-300 nm and sub-200 nm.

US Patent:

20060068335, Mar 30, 2006

Filed:

May 18, 2005

Appl. No.:

11/131890

Inventors:

Suzanne Coley - Mansfield MA, US
Peter Trefonas - Medway MA, US
Patricia Fallon - Newton MA, US
Gerald Wayton - Leicester MA, US

Assignee:

Rohm and Haas Electronic Materials, L.L.C. - Marlborough MA

International Classification:

G03F 7/00
G03F 7/004

US Classification:

430330000, 430009000, 430322000, 430270100

Abstract:

Compositions and methods are provided that can reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing or via-fill layer. Preferred coating composition and methods of the invention can provide enhanced resolution of a patterned overcoated photoresist layer and include use of low activation temperature thermal acid generators as well as multiple thermal treatments to process a layer of the underlying coating composition.

US Patent:

20110033801, Feb 10, 2011

Filed:

May 18, 2010

Appl. No.:

12/782397

Inventors:

Anthony Zampini - Westborough MA, US
Gerald B. Wayton - Leicester MA, US
Vipul Jain - Westborough MA, US
Cong Liu - Shrewsbury MA, US
Suzanne Coley - Mansfield MA, US

Assignee:

Rohm and Haas Electronic Materials LLC - Marlborough MA

International Classification:

G03F 7/004
C09D 177/00
G03F 7/20

US Classification:

4302711, 524607, 430322

Abstract:

Coating compositions for use with an overcoated photoresist are provided where the coating composition comprises a resin containing cyanurate groups and hydrophobic groups. The coating composition can enhance resolution of an overcoated photoresist relief image.

US Patent:

20120141939, Jun 7, 2012

Filed:

Nov 30, 2011

Appl. No.:

13/307198

Inventors:

James W. Thackeray - Braintree MA, US
Suzanne M. Coley - Mansfield MA, US
James F. Cameron - Brookline MA, US
Paul J. LaBeaume - Framingham MA, US
Ahmad E. Madkour - Midland MI, US
Vipul Jain - Westborough MA, US

International Classification:

G03F 7/20
C07C 309/06
G03F 7/027

US Classification:

4302851, 4302811, 430311, 562113

Abstract:

A photoacid generator compound has formula (I):wherein G has formula (II):In formula (II), X is S or I, each Ris commonly attached to X and is independently Calkyl; polycyclic or monocyclic Ccycloalkyl; polycyclic or monocyclic Caryl; or a combination comprising at least one of the foregoing groups. G has a molecular weight greater than 263.4 g/mol, or less than 263.4 g/mol. One or more Rgroups are further attached to an adjacent Rgroup, a is 2 or 3, wherein when X is I, a is 2, or when X is S, a is 2 or 3. Z in formula (I) comprises the anion of a sulfonic acid, a sulfonimide, or a sulfonamide. A photoresist and coated film also includes the photoacid generator, and a method of forming an electronic device uses the photoresist.

US Patent:

20120171616, Jul 5, 2012

Filed:

Dec 29, 2011

Appl. No.:

13/339948

Inventors:

James W. Thackeray - Braintree MA, US
Suzanne M. Coley - Mansfield MA, US
Vipul Jain - Westborough MA, US
James F. Cameron - Brookline MA, US
Paul J. LaBeaume - Framingham MA, US
Ahmad E. Madkour - Midland MI, US

International Classification:

G03F 7/20
C07C 69/593
G03F 7/004
C07C 69/54
C08F 228/06
C08G 63/688

US Classification:

4302851, 526243, 528354, 430311, 430296, 560221, 560222, 560195

Abstract:

A compound has formula (I):wherein Q is a halogenated or non-halogenated, Colefin-containing group, A is a fluorine-substituted Calkylene group, a fluorine-substituted Ccycloalkylene group, a fluorine-substituted Carylene group, or a fluorine-substituted Calkylene-arylene group, Z is an anionic group comprising sulfonate, sulfonamide, or sulfonamide, and G has formula (II):wherein X is S or I, each Ris halogenated or non-halogenated and is independently Calkyl group; a polycyclic or monocyclic Ccycloalkyl group; a polycyclic or monocyclic Caryl group; or a combination of these, wherein when X is S, one of the Rgroups is optionally attached to one adjacent Rgroup by a single bond, and a is 2 or 3, wherein when X is I, a is 2, or when X is S, a is 3. A copolymer, a photoresist, a coated substrate and method of patterning are disclosed.