Thaddeus M Muzyczko

US Patent:

39691195, Jul 13, 1976

Filed:

Jun 9, 1975

Appl. No.:

5/585215

Inventors:

Thaddeus M. Muzyczko - Downers Grove IL
Thomas H. Jones - Naperville IL

Assignee:

The Richardson Company - Des Plaines IL

International Classification:

G03C 168

US Classification:

96115R

Abstract:

A photoreactive composition containing an effective amount of a compound having at least two alkoxyaromaticglyoxy substituents per molecule, which substituents have the following general formula: ##EQU1## wherein R is selected from the class consisting of H, aryl, alkyl, halo and arakyl having up to 10 carbon atoms, n is an integer from 1 to 18, Ar is an aromatic substituent, and M is selected from the class consisting of H, alkali metal, ammonium, and substituted ammonium. These compositions are useful in a wide variety of photochemical and photomechanical processes and are particularly suited for use as photopolymers, photoinitiators and photosensitizers in light sensitive coatings of presensitized lithographic plates.

US Patent:

40465772, Sep 6, 1977

Filed:

Jul 12, 1976

Appl. No.:

5/704384

Inventors:

Thaddeus M. Muzyczko - Downers Grove IL
Thomas H. Jones - Naperville IL

Assignee:

The Richardson Company - Des Plaines IL

International Classification:

G03C 168
G03F 702
G03C 500

US Classification:

96115R

Abstract:

A photoreactive composition containing an effective amount of a polymer which includes as a recurring structure: ##STR1## wherein Ar is a bivalent aromatic radical, and M is selected from the class consisting of hydrogen, alkali metal, ammonium, and substituted ammonium. These compositions are useful in a wide variety of photochemical and photomechanical processes and are particularly suited for use as photopolymers, photoinitiators and photosensitizers in light sensitive coatings of presensitized lithographic plates.

US Patent:

42256615, Sep 30, 1980

Filed:

May 10, 1978

Appl. No.:

5/904378

Inventors:

Thaddeus M. Muzyczko - Downers Grove IL

Assignee:

The Richardson Company - Des Plaines IL

International Classification:

G03C 152
G03F 702

US Classification:

430156

Abstract:

A photoreactive coating composition, particularly suited for use in a lithographic plate, is characterized by both reduced exposure time requirements and an intense visual image which is immediately produced upon exposure of the composition to light permitting visual inspection during imaging. The photoreactive composition has a diazo resin layer and an overlayer which includes a photochromic compound (e. g. an indolinobenzospiropyran compound) and a light sensitive polymer selected from the group cinnamoylated and acrylated photopolymer resins.

US Patent:

44920121, Jan 8, 1985

Filed:

Jan 13, 1982

Appl. No.:

6/339163

Inventors:

Jerome Pala - Arlington Heights IL
Yale Karmell - Chicago IL
Thaddeus M. Muzyczko - Downers Grove IL

Assignee:

Samuel Bingham Company - Mt. Prospect IL

International Classification:

B21K 102

US Classification:

291484D

Abstract:

A roll for use in a printing operation and a method of making same is disclosed. The roll includes a tubular mesh sleeve which is covered with an elastomer composition, such as a Buna-N rubber. The composition includes discrete fibers, such as nylon fibers, which are substantially uniformly dispersed in the composition. The sleeve is stretched over a metal mandrel and the composition, with the fibers therein, is extruded onto the sleeve to form a seamless covering which is vulcanized to the sleeve. The mandrel is removed and the sleeve with its vulcanized covering is then bonded to a metal core by a suitable adhesive, such as an epoxy adhesive, and the outer surface of the covering is ground to raise a nap of the fibers and cleaned to remove any foreign matter not anchored to the coating.

US Patent:

41566122, May 29, 1979

Filed:

Nov 25, 1977

Appl. No.:

5/854703

Inventors:

Thaddeus M. Muzyczko - Downers Grove IL
Thomas H. Jones - Naperville IL

Assignee:

The Richardson Company - Des Plaines IL

International Classification:

G03C 168
G03F 702
G03C 500

US Classification:

96115R

Abstract:

A photoreactive composition containing an effective amount of a polymer which includes as a recurring structure: ##STR1## wherein Ar is a bivalent aromatic radical, and M is selected from the class consisting of hydrogen, alkali metal, ammonium, and substituted ammonium. These compositions are useful in a wide variety of photochemical and photomechanical processes and are particularly suited for use as photopolymers, photoinitiators and photosensitizers in light sensitive coatings of presensitized lithographic plates.

US Patent:

40837246, Apr 11, 1978

Filed:

Aug 4, 1975

Appl. No.:

5/601677

Inventors:

Thaddeus M. Muzyczko - Melrose Park IL
Donald W. Fieder - Wheaton IL

Assignee:

The Richardson Company - Des Plaines IL

International Classification:

G03C 168
C08F 246

US Classification:

96115R

Abstract:

A light-sensitive composition comprising novel arylglyoxyalkyl acrylates that exhibits useful light sensitivity. The basic structure of the new compositions, which may also themselves be polymerized are as follows: ##STR1## wherein Ar represents an aromatic structure selected from the group consisting of benzene, naphthalene and substituted products of each, R. sub. 1 represents an alkyl group having from one to ten carbon atoms, R. sub. 2 represents a grouping selected from the group consisting of hydrogen, or a lower alkyl group having from one to five carbon atoms and R. sub. 3 represents an alkenyl group having from one to ten carbon atoms and singular unsaturation. The light-sensitive compositions may themselves be utilized in photochemistry as photopolymers, they may be combined with suitable solvents and additives or polymerized with suitable backbone polymers to provide substances which can be used as light-sensitive coatings. These coatings may be placed on substrates and in one instance as presensitized lithographic plates.

US Patent:

39948269, Nov 30, 1976

Filed:

Nov 27, 1974

Appl. No.:

5/527775

Inventors:

Thaddeus M. Muzyczko - Downers Grove IL
Jon A. Loboda - Chicago IL

Assignee:

The Richardson Company - Des Plaines IL

International Classification:

B01J 1300

US Classification:

252312

Abstract:

A method of emulsification comprising of utilizing salts of water-soluble organic acids and phenols with at least one salt-forming aminoalkylene group. An illustrative salt which can be used is the reaction product of dodecylbenzene sulfonic acid and 2,6-Bis(dimethylaminomethylene)-4-methyl phenol. These salts in combination with non-ionic surfactants provide particularly useful emulsifying systems in salt water, hard water and bacteria-containing systems.

US Patent:

40778061, Mar 7, 1978

Filed:

Oct 2, 1975

Appl. No.:

5/618990

Inventors:

Thaddeus M. Muzyczko - Melrose Park IL
Donald W. Fieder - Wheaton IL

Assignee:

The Richardson Company - Des Plaines IL

International Classification:

G03C 168
G03C 278
G08F 146
C08F12002

US Classification:

96115R

Abstract:

A light-sensitive composition comprising novel arylglyoxyalkyl acrylates that exhibits useful light sensitivity. The basic structure of the new compositions, which may also themselves be polymerized are as follows: ##STR1## wherein Ar represents an aromatic structure selected from the group consisting of benzene, naphthalene and substituted products of each, R. sub. 1 represents an alkyl group having from one to ten carbon atoms, R. sub. 2 represents a grouping selected from the group consisting of hydrogen, or a lower alkyl group having from one to five carbon atoms and R. sub. 3 represents an alkenyl group having from one to ten carbon atoms and singular unsaturation. The light-sensitive compositions may themselves be utilized in photochemistry as photopolymers, they may be combined with suitable solvents and additives or polymerized with suitable backbone polymers to provide substances which can be used as light-sensitive coatings. These coatings may be placed on substrates and in one instance as presensitized lithographic plates.