John Lesoine

US Patent:

20210096062, Apr 1, 2021

Filed:

Oct 1, 2019

Appl. No.:

16/590373

Inventors:

- WILMINGTON MA, US
John F. Lesoine - San Jose CA, US

International Classification:

G01N 21/21
G02B 7/28
G01J 3/02

Abstract:

An ellipsometer includes a focusing system that uses an image of the measurement spot to determine a best focal position for the ellipsometer. The focus signal is produced by splitting off the ellipsometer measurement spot before the signal is analyzed by a polarizer thereby avoiding imagining the spot with a modulated intensity. The focus signal is imaged on a sensor array and based on the position of the spot on the sensor array, the focal position of the ellipsometer may be determined. A single image may be used to determine the focal position of the ellipsometer permitting a real time focus position measurement.

US Patent:

20190041266, Feb 7, 2019

Filed:

Aug 8, 2017

Appl. No.:

15/672120

Inventors:

- Milpitas CA, US
Aaron Rosenberg - Milpitas CA, US
Dawei Hu - Milpitas CA, US
Alexander Kuznetsov - Milpitas CA, US
Manh Dang Nguyen - Milpitas CA, US
Stilian Pandev - Santa Clara CA, US
John Lesoine - Milpitas CA, US
Qiang Zhao - Milpitas CA, US
Liequan Lee - Fremont CA, US
Houssam Chouaib - San Jose CA, US
Ming Di - Hayward CA, US
Torsten R. Kaack - Los Altos CA, US
Andrei V. Shchegrov - Campbell CA, US
Zhengquan Tan - Milpitas CA, US

International Classification:

G01J 3/18
G01J 3/28

Abstract:

A spectroscopic metrology system includes a spectroscopic metrology tool and a controller. The controller generates a model of a multilayer grating including two or more layers, the model including geometric parameters indicative of a geometry of a test layer of the multilayer grating and dispersion parameters indicative of a dispersion of the test layer. The controller further receives a spectroscopic signal of a fabricated multilayer grating corresponding to the modeled multilayer grating from the spectroscopic metrology tool. The controller further determines values of the one or more parameters of the modeled multilayer grating providing a simulated spectroscopic signal corresponding to the measured spectroscopic signal within a selected tolerance. The controller further predicts a bandgap of the test layer of the fabricated multilayer grating based on the determined values of the one or more parameters of the test layer of the fabricated structure.

US Patent:

20180100796, Apr 12, 2018

Filed:

Dec 8, 2017

Appl. No.:

15/836160

Inventors:

- Milpitas CA, US
John Lesoine - San Jose CA, US
Malik Sadiq - Walnut Creek CA, US
Lanhua Wei - Fremont CA, US
Shankar Krishnan - Santa Clara CA, US
Leonid Poslavsky - Belmont CA, US
Mikhail M. Sushchik - Pleasanton CA, US

International Classification:

G01N 21/21
G01N 21/95
G01N 21/27

Abstract:

Methods and systems for matching measurement spectra across one or more optical metrology systems are presented. The values of one or more system parameters used to determine the spectral response of a specimen to a measurement performed by a target metrology system are optimized. The system parameter values are optimized such that differences between measurement spectra generated by a reference system and the target system are minimized for measurements of the same metrology targets. Methods and systems for matching spectral errors across one or more optical metrology systems are also presented. A trusted metrology system measures the value of at least one specimen parameter to minimize model errors introduced by differing measurement conditions present at the time of measurement by the reference and target metrology systems. Methods and systems for parameter optimization based on low-order response surfaces are presented to reduce the compute time required to refine system calibration parameters.

US Patent:

20140340682, Nov 20, 2014

Filed:

May 15, 2014

Appl. No.:

14/277898

Inventors:

- Milpitas CA, US
John Lesoine - San Jose CA, US
Malik Sadiq - Walnut Creek CA, US
Lanhua Wei - Fremont CA, US
Shankar Krishnan - Santa Clara CA, US
Leonid Poslavsky - Belmont CA, US
Mikhail M. Sushchik - Castro Valley CA, US

International Classification:

G01N 21/21
G01N 21/95

US Classification:

356369

Abstract:

Methods and systems for matching measurement spectra across one or more optical metrology systems are presented. The values of one or more system parameters used to determine the spectral response of a specimen to a measurement performed by a target metrology system are optimized. The system parameter values are optimized such that differences between measurement spectra generated by a reference system and the target system are minimized for measurements of the same metrology targets. Methods and systems for matching spectral errors across one or more optical metrology systems are also presented. A trusted metrology system measures the value of at least one specimen parameter to minimize model errors introduced by differing measurement conditions present at the time of measurement by the reference and target metrology systems. Methods and systems for parameter optimization based on low-order response surfaces are presented to reduce the compute time required to refine system calibration parameters.