Logan L Simpson

US Patent:

8480933, Jul 9, 2013

Filed:

Oct 20, 2009

Appl. No.:

12/582041

Inventors:

Van Nguyen Truskett - Austin TX, US
Stephen C. Johnson - Austin TX, US
Niyaz Khusnatdinov - Round Rock TX, US
Logan Simpson - Coupland TX, US

Assignee:

Molecular Imprints, Inc. - Austin TX

International Classification:

B29C 45/76

US Classification:

264 401

Abstract:

Systems and methods for calibrating a dispense head to provide substantially uniform droplets on a substrate are described.

US Patent:

20100112220, May 6, 2010

Filed:

Oct 29, 2009

Appl. No.:

12/608494

Inventors:

Jared L. Hodge - Austin TX, US
Van Nguyen Truskett - Austin TX, US
Logan Simpson - Coupland TX, US
Bharath Thiruvengadachari - Round Rock TX, US
Stephen C. Johnson - Austin TX, US
Philip D. Schumaker - Austin TX, US

Assignee:

MOLECULAR IMPRINTS, INC. - Austin TX

International Classification:

B05D 5/00

US Classification:

427256

Abstract:

The present application describes methods and systems for setting up and characterizing fluid dispensing systems. The methods and systems characterize the fluid dispensing systems and associate the characterizations with the corresponding fluid dispensing systems.

US Patent:

54987652, Mar 12, 1996

Filed:

Sep 26, 1994

Appl. No.:

8/311027

Inventors:

Burton J. Carpenter - Austin TX
Michael G. McMaster - Austin TX
Joseph LaTorre - Austin TX
Logan L. Simpson - Apalachin NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

G03F 730
G03F 740

US Classification:

430323

Abstract:

A positive acting photoresist comprising a film forming reactive polymer; an iodonium initiator or a non-ionic compound that generates triflic acid upon exposure to radiation; and a multifunctional organic carboxylic acid is provided as well as use thereof.

US Patent:

51027720, Apr 7, 1992

Filed:

Jul 10, 1991

Appl. No.:

7/727935

Inventors:

Raymond W. Angelo - Endwell NY
Jeffrey D. Gelorme - Binghamton NY
Joseph P. Kuczynski - Apalachin NY
William H. Lawrence - Greene NY
Socrates P. Pappas - Fargo ND
Logan L. Simpson - Austin TX

Assignee:

IBM - Armonk NY

International Classification:

G03F 7004
C08G 5968

US Classification:

430280

Abstract:

Photocurable compositions with, as photoinitiator, sulfonium salts of the formula: ##STR1## wherein Ar is a fused aromatic radical; R. sub. 1 is a divalent organic bridge; each R. sub. 2 and R. sub. 3 individually is an alkyl, aryl, alkaryl, aralkyl or substituted aryl, provided that not more than one of R. sub. 2 and R. sub. 3 is alkyl; and A is a non-nucleophilic anion; use thereof and preparation thereof.

US Patent:

60872586, Jul 11, 2000

Filed:

Dec 12, 1996

Appl. No.:

8/764001

Inventors:

Logan Lloyd Simpson - Austin TX
Cindy Reidsema Simpson - Austin TX
Joseph Edward Varsik - Binghamton NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

H01L 2144

US Classification:

438678

Abstract:

A method for selectively metallizing one or more through-holes, other openings (such as slots), or edges of an electronic circuit package comprising the steps of forming a layer of seeding solution on a drilled surface of a substrate of interest exposing this layer to light of appropriate wavelength, through a mask that does not completely cover the through-holes or openings and thereby results in the formation of metal seed on regions of the substrate surface corresponding to the regions of the layer of seeding solution exposed to light; removing the unexposed regions of the layer of seeding solution by subjecting the exposed and unexposed regions of the layer of seeding solution to an alkaline solution. Thereafter, additional metal is deposited, e. g. , plated, onto the metal seed using conventional techniques.

US Patent:

50454315, Sep 3, 1991

Filed:

Feb 13, 1991

Appl. No.:

7/656103

Inventors:

Robert D. Allen - San Jose CA
Gregory M. Wallraff - San Jose CA
Logan L. Simpson - Austin TX
William D. Hinsberg - Fremont CA

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

G03C 176

US Classification:

430270

Abstract:

A new polymer family is shown for use in high speed photoresists. A dry film photoresist includes a polymer binder prepared from t-butyl methacrylate/methylmethacrylate/acrylic acid/ethyl acrylate and a suitable initiator.

US Patent:

50717308, Dec 10, 1991

Filed:

Feb 13, 1991

Appl. No.:

7/656105

Inventors:

Robert D. Allen - San Jose CA
William D. Hinsberg - Fremont CA
Logan L. Simpson - Austin TX
Gregory M. Wallraff - San Jose CA

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

G03C 1492

US Classification:

430270

Abstract:

A new polymer family is shown for use in high sensitivity, high resolution photoresists. A liquid apply resist includes a polymer binder of t-butyl methacrylate/methylmethacrylate/methacrylic acid and an initiator which generates acid upon exposure to radiation.

US Patent:

52664449, Nov 30, 1993

Filed:

Sep 10, 1992

Appl. No.:

7/943075

Inventors:

Burton J. Carpenter - Austin TX
Joseph LaTorre - Austin TX
Michael G. McMaster - Austin TX
Logan L. Simpson - Binghamton NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

C03C 1725

US Classification:

430280

Abstract:

A method and composition are shown for producing a positive-acting photoimagible epoxy resin. In addition to the epoxy resin, the compositions include a dual component cross-linking system which combines a basic curing agent with an onium or arylonium salt. The onium or arylonium salt produces a protic acid upon exposure to irradiation causing a reaction with the basic curing agent which renders the agent ineffective as an epoxy curing agent during subsequent heating. During a subsequent bake operation, only the unexposed regions of the epoxy will cross-link. As a result, the exposed areas wash away, leaving only the cured reverse image.