Abstract:
A method for producing inexpensively in a high yield a halogen-containing aromatic compound, particularly a halogen-containing aromatic compound incorporating therein a bromodifluoroalkyl group, and a halogen-containing naphthalene compound useful as a raw material for a resin excelling in heat resistance, chemical resistance and water repellency, and having a low dielectric constant and a low refractivity are provided. This invention relates to a method for the production of an aromatic compound (II) having a (CH ) CX Br group (wherein X represents a fluorine or chlorine atom and the Xs may be same or different, and n is an integer in the range of 0 to 4) by the reaction of photo-bromination of an aromatic compound (I) having a (CH ) CX H group (wherein X and n are as defined above) with a brominating agent, wherein the photo-bromination reaction is carried out while removing hydrogen bromide generated in the reaction system and/or in an atmosphere of a low oxygen content, and a halogen-containing naphthalene compound represented by the following formula (1): wherein Y represents âCF H, âCF Br, or âCHO group, Z and Z independently represent a halogen atom, and p and q independently are an integer in the range of 0 to 3.